Automatic Reaction Modeling in Chemical Vapor Depositions Using Multiple Process Simulators

2003 ◽  
Vol 804 ◽  
Author(s):  
Takahiro Takahashi ◽  
Kimito Funatsu ◽  
Yoshinori Ema
Keyword(s):  
Experimental Data ◽  
Genetic Algorithms ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Complex Analysis ◽  
Chemical Vapor ◽  
Model Reaction ◽  
Reaction Systems ◽  
Reaction Models ◽  
Multiple Process

ABSTRACTThe identification of appropriate reaction models is very helpful for developing chemical vapor deposition (CVD) processes. In this paper we propose a novel system to analyze experimental data of various CVD reactors and identify reaction models automatically using Genetic Algorithms (GA) with multiple process simulators and modeled functions. We demonstrate that this system is able to adequately model reaction systems, and that complex analysis of various experimental data increased the reliability of the reaction modeling results.

Metastable nanosized diamond formation from a C-H-O fluid system

2010 ◽  
Vol 25 (12) ◽  
pp. 2336-2340 ◽  
Author(s):  
S.K. Simakov
Keyword(s):  
Experimental Data ◽  
Chemical Vapor Deposition ◽  
Synthesis Gas ◽  
Vapor Deposition ◽  
Present Model ◽  
Chemical Vapor ◽  
Cvd Diamond ◽  
Diamond Synthesis ◽  
Diamond Formation ◽  
Fluid System

The model of nanosized diamond particles formation at metastable P-T parameters from a C-H-O fluid system is presented. It explains the hydrothermal formation and growth of diamond and the specifics of chemical vapor deposition (CVD) diamond synthesis gas mixtures at low P-T parameters. Further, the model explains the genesis of interstellar nanodiamond formations in space and the genesis of metamorphic microdiamonds in shallow depth Earth rocks. In contrast to models where many possible reactions are considered, the present model makes the simplest possible assumptions about the key processes, and is then able to account for various tendencies seen in experimental data.

Temperature Distributions in CW Laser Induced Pyrolytic Deposition

1983 ◽  
Vol 29 ◽  
Author(s):  
Klaus Piglmayer ◽  
Josef Doppelbauer ◽  
Dieter BÄuerle
Keyword(s):  
Experimental Data ◽  
Chemical Vapor Deposition ◽  
Laser Radiation ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Numerical Results ◽  
Infinite Plane ◽  
Material Parameters ◽  
Temperature Distributions ◽  
Cw Laser

ABSTRACTTemperature distributions induced by cw laser radiation absorbed on the surface of combined structures, consisting of discs or of stripes on semi - infinite plane substrates, are calculated for different material parameters and different geometries. The relevance of the numerical results is demonstrated by comparison with earlier experimental data obtained in pyrolytic laser-induced chemical vapor deposition.

Fundamental Evaluation of Gas-Phase Elementary Reaction Models for Silicon Carbide Chemical Vapor Deposition

2017 ◽  
Vol 6 (7) ◽  
pp. P399-P404 ◽  
Author(s):  
Yuichi Funato ◽  
Noboru Sato ◽  
Yasuyuki Fukushima ◽  
Hidetoshi Sugiura ◽  
Takeshi Momose ◽  
...  
Keyword(s):  
Silicon Carbide ◽  
Chemical Vapor Deposition ◽  
Gas Phase ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Elementary Reaction ◽  
Reaction Models

Electrochromic Properties of NiO Thin Coatings

2019 ◽  
Vol 822 ◽  
pp. 781-786 ◽  
Author(s):  
Anastasia S. Kondrateva ◽  
Polina Bespalova ◽  
Gennady Konstantinovich Baryshev ◽  
Maxim Mishin
Keyword(s):  
Chemical Vapor Deposition ◽  
Chemical Composition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Thin Coatings ◽  
Reaction Systems ◽  
Fast Switching ◽  
Density Modulation ◽  
Bleached State

In this work, we report the role of structure on electrochromic behavior of nickel oxide thin coatings deposited via chemical vapor deposition on ITO-coated glass in (EtCp)2Ni–O2–Ar and (EtCp)2Ni–O3–O2–Ar reaction systems. The structure and chemical composition were analyzed and then correlated with electrochemical response and transmittance modulation when immersed in 1 M KOH electrolyte. The NiO exhibits an anodic coloration, reaching an optical density modulation of 0.66 between colored and bleached state at 550 nm, with a color efficiency of 30.7 cm2C-1. Very fast switching between states was obtained, the coloration and bleaching time did not exceed 0.05 sec.

scholarly journals Wheel Abrasion Experiment Metals Selection for Mars Pathfinder Mission

1996 ◽  
Vol 458 ◽  
Author(s):  
Aloysius F. Hepp ◽  
Navid S. Fatemi ◽  
David M. Wilt ◽  
Dale C. Ferguson ◽  
Richard W. Hoffman ◽  
...  
Keyword(s):  
Experimental Data ◽  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Anodized Aluminum ◽  
Selection For ◽  
Mars Pathfinder

ABSTRACTA series of metals was examined for suitability for the Wheel Abrasion Experiment, one of ten microrover experiments of the Mars Pathfinder Mission. The seven candidate metals were: Ag, Al, Au, Cu, Ni, Pt, and W. Thin films of candidate metals from 0.1 to 1.0 micrometer thick were deposited on black anodized aluminum coupons by e-beam and resistive evaporation and chemical vapor deposition. Optical, corrosion, abrasion, and adhesion criteria were used to select Al, Ni, and Pt. A description is given of the deposition and testing of thin films, followed by a presentation of experimental data and a brief discussion of follow-on testing and flight qualification.

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