Growth and characterization of spray pyrolysis via deposited Copper oxide thin film

2018 ◽  
Vol 1 (2) ◽  
pp. 9-12
Author(s):  
S.P. Soundararajan ◽  
M Murugan ◽  
K Mohanraj ◽  
Babu Balraj ◽  
Tamiloli Devendhiran

In this work the copper oxide thin films have been coated using Jet nebulizer spray pyrolysis technique. The prepared CuO thin films were characterized by various techniques such as X-ray diffraction (XRD), Scanning Electron Microscope (SEM) and Energy dispersive X-ray spectroscopy (EDX) techniques, in order to study its crystalline nature, particle size and the band gap respectively.

2019 ◽  
Vol 7 (2) ◽  
pp. 14-18 ◽  
Author(s):  
Mohammad G. Faraj ◽  
Askander K. Kaka ◽  
Halo D. Omar

In this paper, copper oxide (CuO) thin films were deposited on polyimide (PI) Plastic substrates with spray pyrolysis technique with different temperatures (i.e. 250–300 °C). All the deposited films were characterized by X-ray diffraction (XRD) and Hall Effect measurements for the Structural and electrical properties. Effects of substrate temperature on the structural and electrical characteristics of the films were studied. The X-ray diffraction patterns’ results reveal that the all of CuO films have a face centered cubic structure. The crystallite grain size was calculated using Scherrer formula and it is found that the substrate temperature (300 0C) has maximum crystallite grain size (81.2 nm). Hall Effect measurements showed that all the films are of p-type conductivity. Depending on the substrate temperature, Hall measurement showed that the electrical resistivity and the carrier concentration varied in the range 77.4 Ω.cm to 52.7 Ω.cm and  6.3 x1015 cm-3 to  10.1 x1015 cm-3.


1996 ◽  
Vol 441 ◽  
Author(s):  
D. R. Acosta ◽  
E. Zironi ◽  
W. Estrada ◽  
E. Montoya

AbstractFluorine doped tin oxide thin films were prepared from solutions with high fluorine contents using the spray pyrolysis technique; the resulting films were studied by electron and X-ray diffraction methods; the resonant nuclear reaction (RNR) method was used to determine the final concentration of fluorine atoms in our films for different doping levels. Also, electrical and optical properties of SnO2:F films were measured and correlated with deposition and structural parameters obtained from X-Ray diffraction and electron microscopy studies.


2019 ◽  
Vol 397 ◽  
pp. 81-87 ◽  
Author(s):  
Farid Khediri ◽  
Abdelkader Hafdallah ◽  
Mouna Bouhelal

In this work Zinc oxide thin films prepared by spray pyrolysis technique. A set of ZnO thin films were deposited with various deposition times, on glass substrate at 350 °C. The precursor solution is formed with zinc acetate in distilled methanol with 0.1 molarity. The deposition time was ranged from 2 to 8 min. The structural and optical properties of those films were examined by X-ray diffraction (XRD) and ultraviolet-visible spectrometer (UV). X-ray diffraction patterns of the ZnO thin films showed polycrystalline hexagonal wurtzite structure and the preferred orientation was along (002) plane when the grain size varied between 9.66 and 16.67nm. ZnO thin films were highly transparent in the visible with the maximum transmittance of 85% and the optical band gap was found between 3.25 and 3.28 eV.


2007 ◽  
Vol 280-283 ◽  
pp. 1171-1174 ◽  
Author(s):  
Ji Ming Bian ◽  
Xiao Min Li ◽  
Xiang Dong Gao ◽  
Wei Dong Yu

Ultrasonic spray pyrolysis has been applied to deposit MgO thin films on Si(100) and quartz glass substrate. The microstructures and properties of the as-grown MgO thin films were examined by X-ray diffraction, scanning electron microscopy, spectrophotometer and semiconductor resistivity meter. The results indicates that the MgO thin films deposited under optimal conditions shows smooth and dense surface without visible pores or defects over the substrate, and as well as good thickness uniformity. Almost completely (100)-oriented MgO films with the transmission higher than 90% in UV/VIS region and the resistivity at least in the order of 107Ω-cm were obtained. MgO thin film with such a crystal quality seems to be very suitable for acting as a buffer layer for the subsequent epitaxial growth of films.


2012 ◽  
Vol 626 ◽  
pp. 672-676
Author(s):  
Boon Hoong Ong ◽  
Heng Choy Lee ◽  
Sharifah Bee Abdul Hamid

Nanostructured SnO2 thin films were deposited on glass substrate using chemical spray pyrolysis technique. Three influent synthesis parameters, namely (i) the precursor concentration (0.2M and 0.5M), (ii) the substrate temperature (250°C and 350°C) and (iii) doping with zinc (Zn) were investigated in term of their effects on the morphology and structure of SnO2 thin films. These films were characterized by X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM) and energy dispersive X-ray spectrometry (EDX) techniques. The grain size of the films was observed to increase as the concentration of the precursors is increased. Substrate temperature is proved to be crucial in determining the crystallinity of the films as the films are reported to grow at temperature above 270°C. Besides, the addition of dopant was found to reduce the grain size of the film.


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