Duty Ratio-Controlled Surface Roughness of Silicon Nitride Film deposited using Room-Temperature SiH4-NH3-N2 Plasma
2010 ◽
Vol 6
(4)
◽
pp. 161-166
◽
Keyword(s):
2010 ◽
Vol 118
(1384)
◽
pp. 1188-1191
Keyword(s):
Keyword(s):
1995 ◽
Vol 34
(Part 1, No. 12B)
◽
pp. 6824-6826
◽
Keyword(s):
Keyword(s):
Keyword(s):