Local Mechanical Properties of Au Thin Films on Polyethylene

2013 ◽  
Vol 586 ◽  
pp. 87-90
Author(s):  
Olga Bláhová ◽  
Petra Bublíková ◽  
Petr Slepička ◽  
Václav Švorčík

Mechanical properties and surface morphology of metallized and grafted PE samples were studied upon their surface modification (plasma exposure and grafting) and subsequent metallization (Au sputtering).

2016 ◽  
Vol 123 (1) ◽  
Author(s):  
Jalal Azadmanjiri ◽  
James Wang ◽  
Christopher C. Berndt ◽  
Cuie Wen ◽  
Vijay K. Srivastava ◽  
...  

2012 ◽  
Vol 2012 ◽  
pp. 1-8 ◽  
Author(s):  
Sandip V. Kamat ◽  
Vijaya Puri ◽  
R. K. Puri

This paper reports on the structural properties of poly(3-methylthiophene) P3MeT thin films prepared by vacuum evaporation on the glass substrates. The structural and surface morphology, wettability, adhesion, and intrinsic stress of these thin films were studied for three different thicknesses. The variation of the film thickness affects the structure, surface, and mechanical properties of P3MeT thin films. Vapor chopping also strongly influences the surface morphology, surface roughness, and wettability of the thin films. It was found that there is a decrease in the intrinsic stress and (RMS) roughness, while the adhesion increases with increase in film thickness.


2003 ◽  
Vol 806 ◽  
Author(s):  
Senthil N Sambandam ◽  
Shekhar Bhansali ◽  
Venkat R. Bhethanabotla

ABSTRACTMicrostructures of multi-component amorphous metallic glass alloys are becoming increasingly important due to their excellent mechanical properties and low coefficient of friction. In this work, thin films of Zr-Ti-Cu-Ni-Be have been deposited by DC magnetron sputtering in view of exploring their potential technological applications in fields such as Micro Electro Mechanical Systems (MEMS). Their structure, composition, surface morphology, mechanical properties viz., hardness and Young's modulus were analyzed using X-Ray Diffraction (XRD), Atomic Force Microscopy (AFM), Scanning Electron Microscopy (SEM) and Nanoindentation. Influence of the deposition parameters of sputtering pressure and power upon the composition and surface morphology of these films has been evidenced by SEM, and AFM analysis, showing that such a process yields very smooth films with target composition at low sputtering pressures. These studies are useful in understanding the multicomponent sputtering process.


2006 ◽  
Vol 976 ◽  
Author(s):  
Yun-Hee Lee ◽  
Yong-Il Kim ◽  
Hoon-Sik Jang ◽  
Seung-Hoon Nahm ◽  
Ju-Young Kim ◽  
...  

AbstractConventional nanoindentation testing generally uses a peak penetration depth of less than 10 % of thin-film thickness in order to measure film-only mechanical properties, without considering the critical depth for a given thin film-substrate system. The uncertainties in this testing condition make hardness measurement more difficult. We propose a new way to determine the critical relative depth for general thin-film/substrate systems; an impression volume analyzed from the remnant indent image is used here as a new parameter. Nanoindents made on soft Cu and Au thin films with various indentation loads were observed by atomic force microscope. The impression volume calculated from 3D remnant image was normalized by the indenter penetration volume. This indent volume ratio varied only slightly in the shallow regime but decreased significantly when the indenter penetration depth exceeded the targeted critical relative depth. Thus, we determined the critical relative depth by empirically fitting the trend of the indent volume ratio and determining the inflection point. The critical relative depths for Cu and Au films were determined as 0.170 and 0.173, respectively, values smaller than 0.249 and 0.183 determined from the hardness variation of the two thin films. Hence the proposed indent volume ratio is highly sensitive to the substrate constraint, and stricter control of the penetration depth is needed to measure film-only mechanical properties.


1997 ◽  
Vol 3 (S2) ◽  
pp. 1281-1282
Author(s):  
A.V. Zagrebelny ◽  
C.B. Carter

It has been long recognized that the understanding of mechanical properties of thin films on substrates requires an understanding of the stresses in the film structures as well as a knowledge of mechanisms by which thin films deform. It has also been shown that these stresses may compromise the performance of integrated circuits, magnetic media, etc. The presence of residual and thermal stresses between the matrix and intergranular films in structural multiphase ceramics is the most common mechanism of failure that often causes deformation and fractureIn this paper, the effect of residual stress on mechanical properties of silicate-glass films on single-crystal α-Al2O3 substrates has been studied with AFM with the emphasis on the changes in surface morphology associated with the film strain and relaxation. The deformation of thin layers of glass on crystalline materials has also been examined using newly developed experimental methods for nanomechanical testing.


2005 ◽  
Vol 875 ◽  
Author(s):  
Yifang Cao ◽  
Zong Zong ◽  
Wole Soboyejo

AbstractThis paper presents the results of nanoindentation experimental studies of Au thin films with different thicknesses. The effects of film thickness and microstructure on the hardnesses of electron-beam deposited Au films were studied in terms of Hall-Petch relationship. The effects of different thicknesses on indentation size effects (ISE) are explained within the framework of mechanism-based strain gradient (MSG) theory using the concept of microstructural length scale.


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