scholarly journals Large-Area Low-Cost Plasmonic Nanostructures in the NIR for Fano Resonant Sensing

2012 ◽  
Vol 24 (35) ◽  
pp. OP247-OP252 ◽  
Author(s):  
Jun Zhao ◽  
Chunjie Zhang ◽  
Paul V. Braun ◽  
Harald Giessen
Keyword(s):  
Low Cost ◽  
Plasmonic Nanostructures ◽  
Large Area

scholarly journals Large area metasurfaces made with spherical silicon resonators

Nanophotonics ◽  
2020 ◽  
Vol 9 (4) ◽  
pp. 943-951
Author(s):  
Pau Molet ◽  
Luz Karimé Gil-Herrera ◽  
Juan Luis Garcia-Pomar ◽  
Niccolò Caselli ◽  
Álvaro Blanco ◽  
...  
Keyword(s):  
Large Scale ◽  
Light Emission ◽  
Low Cost ◽  
Chemical Vapor ◽  
High Refractive Index ◽  
Dielectric Substrate ◽  
Design Parameters ◽  
Plasmonic Nanostructures ◽  
Large Area ◽  
Silicon Resonators

AbstractHigh-index dielectric nanostructures have emerged as an appealing complement to plasmonic nanostructures, offering similar light management capabilities at the nanoscale but free from the inherent optical losses. Despite the great interest in these all-dielectric architectures, their fabrication still requires cumbersome fabrication techniques that limit their implementation in many applications. Hence, the great interest in alternative scalable procedures. Among those, the fabrication of silicon spheres is at the forefront, with several routes available in the literature. However, the exploitation of the Mie modes sustained by these silicon resonators is limited over large areas by polydispersity or a lack of long-range order. Here, we present an all-dielectric metamaterial fabricated with a low cost and highly scalable technique: a combination of soft imprinting nanolithography and chemical vapor deposition. The resulting all-dielectric metasurface is composed of an array of silicon hemispheres on top of a high refractive index dielectric substrate. This architecture allows the exploitation of high-quality Mie resonances at a large scale due to the high monodispersity of the hemispheres organized in a single crystal two-dimensional lattice. The optical response of the metasurface can be engineered by the design parameters of the nanoimprinted structure. We further demonstrate the potential of this platform to enhance light emission by coupling dye molecules to the sustained Mie resonances and measuring both an eight-fold amplified signal and a triple lifetime reduction.

scholarly journals Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials

2014 ◽  
Vol 5 ◽  
pp. 577-586 ◽  
Author(s):  
Jun Zhao ◽  
Bettina Frank ◽  
Frank Neubrech ◽  
Chunjie Zhang ◽  
Paul V Braun ◽  
...  
Keyword(s):  
Composite Materials ◽  
Low Cost ◽  
Plasmonic Nanostructures ◽  
Large Area ◽  
Process Step ◽  
Plasmonic Structures ◽  
Chiral Structures ◽  
Angle Rotation ◽  
Optical Applications ◽  
Complex Nanostructures

Many nano-optical applications require a suitable nanofabrication technology. Hole-mask colloidal nanolithography has proven to be a low-cost and large-area alternative for the fabrication of complex plasmonic nanostructures as well as metamaterials. In this paper, we describe the fabrication process step by step. We manufacture a variety of different plasmonic structures ranging from simple nano-antennas over complex chiral structures to stacked composite materials for applications such as sensing. Additionally, we give details on the control of the nanostructure lateral density which allows for the multilayer-fabrication of complex nanostructures. In two accompanying movies, the fabrication strategy is explained and details are being demonstrated in the lab. The movies can be found at the website of Beilstein TV.

Computer simulation study about the dependence of amorphous silicon photonic waveguides efficiency on the material quality

2020 ◽  
Vol 90 (3) ◽  
pp. 30502
Author(s):  
Alessandro Fantoni ◽  
João Costa ◽  
Paulo Lourenço ◽  
Manuela Vieira
Keyword(s):  
Amorphous Silicon ◽  
High Throughput Screening ◽  
Simulation Analysis ◽  
Low Cost ◽  
Deposition Process ◽  
Large Area ◽  
Sidewall Roughness ◽  
Sensing Applications ◽  
Fabrication Defects ◽  
The Impact

Amorphous silicon PECVD photonic integrated devices are promising candidates for low cost sensing applications. This manuscript reports a simulation analysis about the impact on the overall efficiency caused by the lithography imperfections in the deposition process. The tolerance to the fabrication defects of a photonic sensor based on surface plasmonic resonance is analysed. The simulations are performed with FDTD and BPM algorithms. The device is a plasmonic interferometer composed by an a-Si:H waveguide covered by a thin gold layer. The sensing analysis is performed by equally splitting the input light into two arms, allowing the sensor to be calibrated by its reference arm. Two different 1 × 2 power splitter configurations are presented: a directional coupler and a multimode interference splitter. The waveguide sidewall roughness is considered as the major negative effect caused by deposition imperfections. The simulation results show that plasmonic effects can be excited in the interferometric waveguide structure, allowing a sensing device with enough sensitivity to support the functioning of a bio sensor for high throughput screening. In addition, the good tolerance to the waveguide wall roughness, points out the PECVD deposition technique as reliable method for the overall sensor system to be produced in a low-cost system. The large area deposition of photonics structures, allowed by the PECVD method, can be explored to design a multiplexed system for analysis of multiple biomarkers to further increase the tolerance to fabrication defects.

A novel low cost texturization method for large area commercial mono-crystalline silicon solar cells

2006 ◽  
Vol 90 (20) ◽  
pp. 3557-3567 ◽  
Author(s):  
U. Gangopadhyay ◽  
K.H. Kim ◽  
S.K. Dhungel ◽  
U. Manna ◽  
P.K. Basu ◽  
...  
Keyword(s):  
Solar Cells ◽  
Crystalline Silicon ◽  
Low Cost ◽  
Silicon Solar Cells ◽  
Large Area ◽  
Crystalline Silicon Solar Cells

scholarly journals Superhydrophobicity and Durability in Recyclable Polymers Coating

2021 ◽  
Vol 13 (15) ◽  
pp. 8244
Author(s):  
Francesca Cirisano ◽  
Michele Ferrari
Keyword(s):  
Thermal Treatment ◽  
Superhydrophobic Surface ◽  
Low Cost ◽  
Spray Coating ◽  
Large Area ◽  
Average Roughness ◽  
Water Contact ◽  
Alkaline Environments ◽  
Fine Control ◽  
Recycle And Reuse

Highly hydrophobic and superhydrophobic materials obtained from recycled polymers represent an interesting challenge to recycle and reuse advanced performance materials after their first life. In this article, we present a simple and low-cost method to fabricate a superhydrophobic surface by employing polytetrafluoroethylene (PTFE) powder in polystyrene (PS) dispersion. With respect to the literature, the superhydrophobic surface (SHS) was prepared by utilizing a spray- coating technique at room temperature, a glass substrate without any further modification or thermal treatment, and which can be applied onto a large area and on to any type of material with some degree of fine control over the wettability properties. The prepared surface showed superhydrophobic behavior with a water contact angle (CA) of 170°; furthermore, the coating was characterized with different techniques, such as a 3D confocal profilometer, to measure the average roughness of the coating, and scanning electron microscopy (SEM) to characterize the surface morphology. In addition, the durability of SH coating was investigated by a long-water impact test (raining test), thermal treatment at high temperature, an abrasion test, and in acidic and alkaline environments. The present study may suggest an easy and scalable method to produce SHS PS/PTFE films that may find implementation in various fields.

scholarly journals Interaction-tailored organization of large-area colloidal assemblies

2018 ◽  
Vol 9 ◽  
pp. 1582-1593 ◽  
Author(s):  
Silvia Rizzato ◽  
Elisabetta Primiceri ◽  
Anna Grazia Monteduro ◽  
Adriano Colombelli ◽  
Angelo Leo ◽  
...  
Keyword(s):  
Film Formation ◽  
Low Cost ◽  
Interparticle Distance ◽  
Particle Interactions ◽  
Polystyrene Spheres ◽  
Large Area ◽  
Nanoscale Patterning ◽  
Particle Solution ◽  
Number Of Particles ◽  
Deposition Conditions

Colloidal lithography is an innovative fabrication technique employing spherical, nanoscale crystals as a lithographic mask for the low cost realization of nanoscale patterning. The features of the resulting nanostructures are related to the particle size, deposition conditions and interactions involved. In this work, we studied the absorption of polystyrene spheres onto a substrate and discuss the effect of particle–substrate and particle–particle interactions on their organization. Depending on the nature and the strength of the interactions acting in the colloidal film formation, two different strategies were developed in order to control the number of particles on the surface and the interparticle distance, namely changing the salt concentration and absorption time in the particle solution. These approaches enabled the realization of large area (≈cm2) patterning of nanoscale holes (nanoholes) and nanoscale disks (nanodisks) of different sizes and materials.

Patterning Organic Fluorescent Molecules with SAM Patterns

2011 ◽  
Vol 1335 ◽  
Author(s):  
Qiong Wu ◽  
Juanyuan Hao ◽  
Shoulei Shi ◽  
Weifeng Wang ◽  
Nan Lu
Keyword(s):  
Organic Molecules ◽  
Low Cost ◽  
Substrate Surface ◽  
Large Area ◽  
Self Assembled Monolayer ◽  
Storage Duration ◽  
Light Emitting ◽  
High Throughput Method ◽  
Self Assembled ◽  
Fluorescent Molecules

ABSTRACTWe report a low-cost and high-throughput method to fabricate large-area light emitting pattern via thermal evaporation of organic molecules on the patterned self-assembled monolayer of homogenous 3-aminopropyltrimethoxysilane. This method is based on the selective deposition of the organic light emitting molecules on the template of self-assembled monolayer (SAM), which is patterned with nanoimprinting lithography. The selectivity can be controlled by adjusting the design of the pattern, the storage duration and the substrate temperature. The deposition selectivity of the molecules may be caused by the different binding energy of the molecules with the SAM and the substrate surface.

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