A novel low cost texturization method for large area commercial mono-crystalline silicon solar cells

2006 ◽  
Vol 90 (20) ◽  
pp. 3557-3567 ◽  
Author(s):  
U. Gangopadhyay ◽  
K.H. Kim ◽  
S.K. Dhungel ◽  
U. Manna ◽  
P.K. Basu ◽  
...  
2005 ◽  
Vol 20 (9) ◽  
pp. 938-946 ◽  
Author(s):  
U Gangopadhyay ◽  
S K Dhungel ◽  
K Kim ◽  
U Manna ◽  
P K Basu ◽  
...  

2007 ◽  
Vol 91 (20) ◽  
pp. 1943-1947 ◽  
Author(s):  
N. Marrero ◽  
B. González-Díaz ◽  
R. Guerrero-Lemus ◽  
D. Borchert ◽  
C. Hernández-Rodríguez

2019 ◽  
Vol 2019 ◽  
pp. 1-7
Author(s):  
Abdullah Uzum ◽  
Hiroyuki Kanda ◽  
Takuma Noguchi ◽  
Yuya Nakazawa ◽  
Shota Taniwaki ◽  
...  

Aluminum acetylacetonate-based AlOx thin films were introduced as a low-cost, high-quality passivation layers for crystalline silicon solar cells. Films were formed by a spin coating method on p-type silicon substrates at 450°C in ambient air, O2, or water vapor (H2O/O2) for 15 or 120 min. XPS analysis confirms the AlOx formation and reveals a high intensity of interfacial SiOx at the AlOx/Si interface of processed wafers. Ambient H2O/O2 was found to be more beneficial for the activation of introduced AlOx passivation films which offers high lifetime improvements with a low thermal budget. Carrier lifetime measurements provides that symmetrically coated wafers reach 119.3 μs and 248.3 μs after annealing in ambient H2O/O2 for 15 min and 120 min, respectively.


Author(s):  
Yutaka Hayashi ◽  
Tadashi Saitoh ◽  
Kunio Hane ◽  
Ryuichi Shimokawa ◽  
Toshihide Takeshita

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