New Structures of the Super-Resolution Near-Field Phase-Change Optical Disk and a New Mask-Layer Material

Author(s):  
Lu Ping Shi ◽  
Tow Chong Chong
2001 ◽  
Vol 40 (Part 1, No. 3B) ◽  
pp. 1649-1650 ◽  
Author(s):  
Lu Ping Shi ◽  
Tow Chong Chong ◽  
Xiang Shui Miao ◽  
Pik Kee Tan ◽  
Jian Ming Li

Author(s):  
L.P. Shi ◽  
T.C. Chong ◽  
X. Hu ◽  
J.M. Li ◽  
K.C. Zhao ◽  
...  

2005 ◽  
Vol 44 (5B) ◽  
pp. 3615-3619 ◽  
Author(s):  
Luping Shi ◽  
Tong Chong Chong ◽  
Pik Kee Tan ◽  
Jianming Li ◽  
Xiang Hu ◽  
...  

2008 ◽  
Vol 47 (7) ◽  
pp. 6025-6028 ◽  
Author(s):  
Mei Ling Lee ◽  
Xiang Shui Miao ◽  
Lu Ping Shi

2004 ◽  
Vol 43 (7B) ◽  
pp. 5001-5005 ◽  
Author(s):  
Luping Shi ◽  
Towchong Chong ◽  
Pik Kee Tan ◽  
Xiang Hu ◽  
Jianming Li ◽  
...  

2009 ◽  
Vol 48 (3) ◽  
pp. 03A063
Author(s):  
Mei Ling Lee ◽  
Kok Thong Yong ◽  
Chee Lip Gan ◽  
Lee Hou Ting ◽  
Lu Ping Shi

Author(s):  
Yizhao Guan ◽  
Hiromasa Kume ◽  
Shotaro Kadoya ◽  
Masaki Michihata ◽  
Satoru Takahashi

Abstract Microstructures are widely used in the manufacture of functional surfaces. An optical-based super-resolution, non-invasive method is preferred for the inspection of surfaces with massive microstructures. The Structured Illumination Microscopy (SIM) uses standing-wave illumination to reach optical super-resolution. Recently, coherent SIM is being studied. It can obtain not only the super-resolved intensity distribution but also the phase and amplitude distribution of the sample surface beyond the diffraction limit. By analysis of the phase-depth dependency, the depth measurement for microgroove structures with coherent SIM is expected. FDTD analysis is applied for observing the near-field response of microgroove under the standing-wave illumination. The near-field phase shows depth dependency in this analysis. Moreover, the effects from microgroove width, the incident angle, and the relative position between the standing-wave peak and center of the microgroove are investigated. It is found the near-field phase change can measure depth until 200 nm (aspect ratio 1) with an error of up to 20.4 nm in the case that the microgroove width is smaller than half of the wavelength.


2001 ◽  
Vol 674 ◽  
Author(s):  
Takayuki Shima ◽  
Johoo Kim ◽  
Hiroshi Fuji ◽  
Nobufumi Atoda ◽  
Junji Tominaga

ABSTRACTSuper-resolution near-field structure (Super-RENS) was prepared by a heliconwave-plasma sputtering method to improve the disk property that is combined with a magneto-optical (MO) recording disk. Antimony and silver-oxide mask layers were prepared by the method and refractive indices were measured. Recording and retrieving of signals beyond the resolution limit (<370 nm) were achieved for both mask cases. Attempts to optimize the disk structure were also made using a conventional sputtering method. The smallest mark size was around 200 nm and the highest carrier-to-noise ratio (CNR) was 30 dB for 300-nm mark and 22 dB for 250-nm, when using a laser wavelength of 780 nm and a numerical aperture of 0.53. We have found that there is a competing super-resolutional mechanism besides Super-RENS that appears when high readout laser power is applied. This mechanism played rather an important role at least in the mark-size range of 200-370 nm.


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