Influence of the Composition of the Radio-Frequency Sputtering Atmosphere on the Density of States and Interband Light Absorption in thin Y2O3 Films

2022 ◽  
Author(s):  
O. M. Bordun ◽  
B. O. Bordun ◽  
I. M. Kofliuk ◽  
I. Yo. Kukharskyy ◽  
I. I. Medvid
Keyword(s):  
Radio Frequency ◽  
Density Of States ◽  
Light Absorption ◽  
Radio Frequency Sputtering ◽  
Interband Light Absorption

INFLUENCE OF THE COMPOSITION OF THE RADIO-FREQUENCY SPUTTERING ATMOSPHERE ON THE DENSITY OF STATES AND INTERBAND LIGHT ABSORPTION IN THIN Y2O3 FILMS

2021 ◽  
Vol 88 (6) ◽  
pp. 881-886
Author(s):  
O. M. Bordun ◽  
I. O. Bordun ◽  
I. M. Kofliuk ◽  
I. Yo. Kukharskyy ◽  
I. I. Medvid
Keyword(s):  
Absorption Band ◽  
Density Of States ◽  
Interband Absorption ◽  
Long Wavelength ◽  
Plasma Sputtering ◽  
Radio Frequency Sputtering ◽  
Ion Plasma ◽  
Quasi Classical Approximation ◽  
Heavily Doped ◽  
Interband Light Absorption

The long-wavelength edge of the fundamental absorption band of thin Y2O3 films obtained by radiofrequency ion-plasma sputtering is investigated. The edge of interband absorption after annealing of the films in an atmosphere of argon, oxygen, or a mixture of these gases is shown to be approximated well by the Urbach empirical rule. Diffractograms of the obtained films were studied and a model of a heavily doped or defective semiconductor in the quasi-classical approximation was used to analyze the experimental results. This model allows determining the radius of the basic electronic state, the screening radius, and the rootmean-square potential depending on the sputtering atmosphere.

Annealing Effects on Cathodoluminescence Properties of SiOxFilms Deposited by Radio Frequency Sputtering

2011 ◽  
Vol 50 ◽  
pp. 01BF04 ◽  
Author(s):  
Ahmed Mohamed Ahmed Abd El-Razek Shamekh ◽  
Norio Tokuda ◽  
Takao Inokuma
Keyword(s):  
Radio Frequency ◽  
Radio Frequency Sputtering ◽  
Annealing Effects

Radio frequency sputtering of ferrimagnetic thin films

1971 ◽  
Vol 21 (4-5) ◽  
pp. 558-562 ◽  
Author(s):  
R. Metselaar ◽  
P. Rem
Keyword(s):  
Thin Films ◽  
Radio Frequency ◽  
Radio Frequency Sputtering
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