Point defect populations in amorphous and crystalline silicon

1990 ◽  
Vol 75 (3) ◽  
pp. 197-200 ◽  
Author(s):  
S. Roorda ◽  
J.M. Poate ◽  
D.C. Jacobson ◽  
D.J. Eaglesham ◽  
B.S. Dennis ◽  
...  
Keyword(s):  
Point Defect ◽  
Crystalline Silicon

Point Defect-Based Modeling of Transient Diffusion of Boron Implanted in Silicon Along Random and Channeling Directions

1995 ◽  
Vol 389 ◽  
Author(s):  
H. U. Jäger
Keyword(s):  
Point Defect ◽  
Anomalous Diffusion ◽  
Crystalline Silicon ◽  
Electrical Activation ◽  
Transient Diffusion ◽  
Model Predictions ◽  
Post Implantation

ABSTRACTA point defect-based model, which has been developed to describe diffusion and electrical activation of boron in crystalline silicon during post-implantation annealing, is used to simulate the anomalous diffusion of boron implanted into silicon along the random and [100] channeling directions. The model predictions are compared to data measured by Chu et al.

Light-induced point defect reactions of residual iron in crystalline silicon after aluminum gettering

2010 ◽  
Vol 108 (4) ◽  
pp. 043519 ◽  
Author(s):  
D. Abdelbarey ◽  
V. Kveder ◽  
W. Schröter ◽  
M. Seibt
Keyword(s):  
Point Defect ◽  
Crystalline Silicon ◽  
Defect Reactions

Self-interstitials have never been observed in crystalline Si. How about amorphous Si?

2000 ◽  
Vol 609 ◽  
Author(s):  
Sjoerd Roorda
Keyword(s):  
Distribution Function ◽  
High Resolution ◽  
Point Defect ◽  
Radial Distribution Function ◽  
Direct Observation ◽  
Crystalline Silicon ◽  
Direct Detection ◽  
Before And After ◽  
Amorphous Si ◽  
Diffusion Behaviour

ABSTRACTIn the early days of point defect studies in electron irradiated crystalline silicon, it was surmised that the Si self-interstitial is highly mobile even at 4 K and escapes direct detection. The existence of self-interstitials has of course been confirmed through the diffusion behaviour of a range of impurities and the direct observation of larger interstitial-type clusters. Against this background, the direct observation of self-interstitials in amorphous Si would seem next to impossible. Yet just such an observation may have been made recently, through a comparison of the high-resolution radial distribution function of pure amorphous Si before and after thermal anneal and that of crystalline Si.

Detection of a point defect in a silicon single crystal by high-resolution TEM

1995 ◽  
Vol 53 ◽  
pp. 466-467
Author(s):  
M. Awaji
Keyword(s):  
High Resolution ◽  
Single Crystal ◽  
Point Defect ◽  
Point Defects ◽  
Noise Level ◽  
Dark Field ◽  
Silicon Single Crystal ◽  
High Resolution Image ◽  
Dark Field Imaging ◽  
Field Imaging

It is necessary to improve the resolution, brightness and signal-to-noise ratio(s/n) for the detection and identification of point defects in crystals. In order to observe point defects, multi-beam dark-field imaging is one of the useful methods. Though this method can improve resolution and brightness compared with dark-field imaging by diffuse scattering, the problem of s/n still exists. In order to improve the exposure time due to the low intensity of the dark-field image and the low resolution, we discuss in this paper the bright-field high-resolution image and the corresponding subtracted image with reference to a changing noise level, and examine the possibility for in-situ observation, identification and detection of the movement of a point defect produced in the early stage of damage process by high energy electron bombardment.The high-resolution image contrast of a silicon single crystal in the [10] orientation containing a triple divacancy cluster is calculated using the Cowley-Moodie dynamical theory and for a changing gaussian noise level. This divacancy model was deduced from experimental results obtained by electron spin resonance. The calculation condition was for the lMeV Berkeley ARM operated at 800KeV.

Point Defect Absorption and Dislocation Loop Formation at Grain Boundaries in Hvem-Irradiated Zr and Its Alloys:1. Influence of Solute Addition

1985 ◽  
Vol 43 ◽  
pp. 350-351
Author(s):  
R.A. Herring ◽  
M. Griffiths ◽  
M.H Loretto ◽  
R.E. Smallman
Keyword(s):  
Grain Boundary ◽  
Grain Boundaries ◽  
Point Defect ◽  
Reactor Core ◽  
Solute Concentration ◽  
Nuclear Industry ◽  
Dislocation Loops ◽  
Loop Formation ◽  
Component Material ◽  
Impurity Interaction

Because Zr is used in the nuclear industry to sheath fuel and as structural component material within the reactor core, it is important to understand Zr's point defect properties. In the present work point defect-impurity interaction has been assessed by measuring the influence of grain boundaries on the width of the zone denuded of dislocation loops in a series of irradiated Zr alloys. Electropolished Zr and its alloys have been irradiated using an AEI EM7 HVEM at 1 MeV, ∼675 K and ∼10-6 torr vacuum pressure. During some HVEM irradiations it has been seen that there is a difference in the loop nucleation and growth behaviour adjacent to the grain boundary as compared with the mid-grain region. The width of the region influenced by the presence of the grain boundary should be a function of the irradiation temperature, dose rate, solute concentration and crystallographic orientation.

On the interpretation of dislocation-loop growth during in-situ high-voltage Electron Microscopy

1990 ◽  
Vol 48 (4) ◽  
pp. 532-533
Author(s):  
E. Holzäpfel ◽  
F. Phillipp ◽  
M. Wilkens
Keyword(s):  
Point Defect ◽  
Rate Equations ◽  
Rate Theory ◽  
Dislocation Loops ◽  
High Voltage Electron Microscopy ◽  
Vacancy Migration ◽  
Voltage Electron ◽  
Reaction Rate Theory ◽  
Defect Reactions

During in-situ radiation damage experiments aiming on the investigation of vacancy-migration properties interstitial-type dislocation loops are used as probes monitoring the development of the point defect concentrations. The temperature dependence of the loop-growth rate v is analyzed in terms of reaction-rate theory yielding information on the vacancy migration enthalpy. The relation between v and the point-defect production rate P provides a critical test of such a treatment since it is sensitive to the defect reactions which are dominant. If mutual recombination of vacancies and interstitials is the dominant reaction, vαP0.5 holds. If, however, annihilation of the defects at unsaturable sinks determines the concentrations, a linear relationship vαP is expected.Detailed studies in pure bcc-metals yielded vαPx with 0.7≾×≾1.0 showing that besides recombination of vacancies and interstitials annihilation at sinks plays an important role in the concentration development which has properly to be incorporated into the rate equations.

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