Field emission ultrahigh-resolution analytical electron microscope

1994 ◽  
Vol 54 (2-4) ◽  
pp. 132-144 ◽  
Author(s):  
T. Honda ◽  
T. Tomita ◽  
T. Kaneyama ◽  
Y. Ishida
Keyword(s):  
Electron Microscope ◽  
Field Emission ◽  
Ultrahigh Resolution ◽  
Analytical Electron ◽  
Analytical Electron Microscope

Atomic resolution AEM (ARAEM) of oxide superconductors

1992 ◽  
Vol 50 (1) ◽  
pp. 74-75
Author(s):  
Vinayak P. Dravid ◽  
H. Zhang ◽  
L.D. Marks ◽  
J.P. Zhang
Keyword(s):  
Electron Microscope ◽  
Field Emission ◽  
Atomic Resolution ◽  
Oxide Superconductors ◽  
Electron Holography ◽  
Analytical Electron ◽  
Analytical Electron Microscope ◽  
Point To Point ◽  
Single Instrument ◽  
Better Than

A 200 kV cold field emission gun atomic resolution analytical electron microscope (ARAEM, Hitachi HF-2000) has been recently installed at Northwestern. The ARAEM offers an unprecedented combination of atomic structure imaging of better than 0.20 nm nominal point-to-point resolution and about 0.10 nm line resolution, alongwith nanoscale analytical capabilities and electron holography in one single instrument. The ARAEM has been fully functional/operational and this paper presents some illustrative examples of application of ARAEM techniques to oxide superconductors. Additional results will be presented at the meeting.

Development of 200kV ultrahigh-resolution analytical electron microscope

1989 ◽  
Vol 47 ◽  
pp. 108-109
Author(s):  
T. Kaneyama ◽  
M. Naruse ◽  
Y. Ishida ◽  
M. Kersker
Keyword(s):  
Electron Microscope ◽  
Optical Constants ◽  
Materials Science ◽  
Objective Lens ◽  
The Finite Element Method ◽  
Ultrahigh Resolution ◽  
Analytical Electron ◽  
Analytical Electron Microscope ◽  
Characteristic Features ◽  
Better Than

In the field of materials science, the importance of the ultrahigh resolution analytical electron microscope (UHRAEM) is increasing. A new UHRAEM which provides a resolution of better than 0.2 nm and allows analysis of a few nm areas has been developed. [Fig. 1 shows the external view] The followings are some characteristic features of the UHRAEM.Objective lens (OL)Two types of OL polepieces (URP for ±10' specimen tilt and ARP for ±30' tilt) have been developed. The optical constants shown in the table on the next page are figures calculated by the finite element method. However, Cs was experimentally confirmed by two methods (namely, Beam Tilt method and Krivanek method) as 0.45 ∼ 0.50 mm for URP and as 0.9 ∼ 1.0 mm for ARP, respectively. Fig. 2 shows an optical diffractogram obtained from a micrograph of amorphous carbon with URP under the Scherzer defocus condition. It demonstrates a resolution of 0.19 nm and a Cs smaller than 0.5 mm.

Development of high-performance objective lens polepiece for ultrahigh resolution Analytical Electron Microscope

1993 ◽  
Vol 51 ◽  
pp. 254-255
Author(s):  
K. Fukushima ◽  
T. Kaneyama ◽  
F. Hosokawa ◽  
H. Tsuno ◽  
T. Honda ◽  
...  
Keyword(s):  
Electron Microscope ◽  
High Performance ◽  
Open Space ◽  
Materials Science ◽  
Objective Lens ◽  
Ultrahigh Resolution ◽  
Science Field ◽  
Specimen Holder ◽  
Analytical Electron ◽  
Analytical Electron Microscope

Recently, in the materials science field, the ultrahigh resolution analytical electron microscope (UHRAEM) has become a very important instrument to study extremely fine areas of the specimen. The requirements related to the performance of the UHRAEM are becoming gradually severer. Some basic characteristic features required of an objective lens are as follows, and the practical performance of the UHRAEM should be judged by totally evaluating them.1) Ultrahigh resolution to resolve ultrafine structure by atomic-level observation.2) Nanometer probe analysis to analyse the constituent elements in nm-areas of the specimen.3) Better performance of x-ray detection for EDS analysis, that is, higher take-off angle and larger detection solid angle.4) Higher specimen tilting angle to adjust the specimen orientation.To attain these requirements simultaneously, the objective lens polepiece must have smaller spherical and chromatic aberration coefficients and must keep enough open space around the specimen holder in it.

X-ray detection performance of a 300KV field-emission Analytical Electron Microscope

1993 ◽  
Vol 51 ◽  
pp. 250-251
Author(s):  
C. E. Lyman ◽  
J. I. Goldstein ◽  
D.B. Williams ◽  
D.W. Ackland ◽  
S. von Harrach ◽  
...  
Keyword(s):  
Electron Microscope ◽  
Field Emission ◽  
Spatial Resolution ◽  
High Spatial Resolution ◽  
Detection Performance ◽  
Electron Gun ◽  
X Rays ◽  
X Ray ◽  
Analytical Electron ◽  
Analytical Electron Microscope

A major goal of analytical electron micrsocopy (AEM) is to detect small amounts of an element in a given matrix at high spatial resolution. While there is a tradeoff between low detection limit and high spatial resolution, a field emission electron gun allows detection of small amounts of an element at sub-lOnm spatial resolution. The minimum mass fraction of one element measured in another is proportional to [(P/B)·P]-1/2 where the peak-to-background ratio P/B and the peak intensity P both must be high to detect the smallest amount of an element. Thus, the x-ray detection performance of an analytical electron microscope may be characterized in terms of standardized measurements of peak-to-background, x-ray intensity, the level of spurious x-rays (hole count), and x-ray detector performance in terms of energy resolution and peak shape.This paper provides measurements of these parameters from Lehigh’s VG Microscopes HB-603 field emission AEM. This AEM was designed to provide the best x-ray detection possible.

Development of a 300 kV field emission TEM

1993 ◽  
Vol 51 ◽  
pp. 1080-1081
Author(s):  
Y. Ishida ◽  
Y. Bando ◽  
Y. Kitami ◽  
T. Tomita ◽  
M. Kersker
Keyword(s):  
Electron Microscope ◽  
Field Emission ◽  
Atomic Layer ◽  
Electron Gun ◽  
Emission Current ◽  
Long Period ◽  
Current Variation ◽  
Analytical Electron ◽  
Analytical Electron Microscope ◽  
Ultrahigh Sensitivity

The 300 kV analytical electron microscope, as compared with the 100 to 200 kV instruments, have excellent features such as the high resolution of TEM images, high P/B ratio of EDS and PEELS, and high spacial resolution in analysis.We hereby report the principal specifications of an ultrahigh sensitivity and ultrahigh resolution field emission type electron microscope, which, capable of giving full play to the above-mentioned features of the 300 kV analytical instrument, allows elemental analysis at the single atomic layer level (nm regions).Its electron gun, simply operated by CPU control, allows emission current to be obtained at the touch of a single button. As the emitter, a W (100)-TF emitter, which can be used simply, stably, and for a long period of time, is employed. After build-up, this emitter can obtain about 10 times the angular current density of the W (310) emitter. Around the emitter are provided three electrodes to make emission current variation and electrostatic lens function independent of each other.

scholarly journals Performance and Application of an Aberration Corrected Analytical Electron Microscope with a Cold Field Emission Gun

2011 ◽  
Vol 17 (S2) ◽  
pp. 1162-1163
Author(s):  
Y Kohno ◽  
E Okunishi ◽  
I Ishikawa ◽  
T Tomita ◽  
T Kaneyama ◽  
...  
Keyword(s):  
Electron Microscope ◽  
Field Emission ◽  
Analytical Electron ◽  
Analytical Electron Microscope ◽  
Aberration Corrected

Extended abstract of a paper presented at Microscopy and Microanalysis 2011 in Nashville, Tennessee, USA, August 7–August 11, 2011.

scholarly journals Development of a 300kV ultrahigh resolution analytical electron microscope

1991 ◽  
Vol 49 ◽  
pp. 350-351
Author(s):  
Kurio Fukushima ◽  
Yoshihiro Arai ◽  
Masahiro Kawasaki ◽  
Yasushi Kokubo
Keyword(s):  
Electron Microscope ◽  
Electron Gun ◽  
External View ◽  
Ultrahigh Resolution ◽  
Science Field ◽  
Heating And Cooling ◽  
Resolution Observation ◽  
Analytical Electron ◽  
Analytical Electron Microscope ◽  
Characteristic Features

Intended for atomic-level observation and analysis in the material science field, a 300 kV ultrahigh resolution analytical electron microscope (UHRAEM) has been newly developed on the basis of the JEM-2010, a 200 kV UHRAEM. There are two versions: the UHR version, intended for ultrahigh resolution observation with a point resolution of 0.17 nm and the multi-purpose HT version, featuring specimen tilt angles as large as± 40° , and heating and cooling holders. The external view of the instrument is shown in Fig.1. Some characteristic features of the 300 kV UHRAEM are shown as follows.Electron Gun: An extremely stable and compact 300 kV election gun is constructed with 10-stage accelerating tube. SF6 gas is used for electric insulation.

scholarly journals Development of a 300 kV ultrahigh resolution analytical electron microscope

1990 ◽  
Vol 1 (3) ◽  
pp. 233-240
Author(s):  
Yoshihiro Arai ◽  
Kurio Fukushima ◽  
Yasushi Kokubo ◽  
Alain Michot
Keyword(s):  
Electron Microscope ◽  
Ultrahigh Resolution ◽  
Analytical Electron ◽  
Analytical Electron Microscope

Development of 100 kV Field Emission Scanning Electron Microscope

1974 ◽  
Vol 32 ◽  
pp. 408-409
Author(s):  
H. Koike ◽  
Y. Harada ◽  
T. Goto ◽  
Y.Kokubo ◽  
K. Yamada ◽  
...  
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Field Emission ◽  
Chemical Elements ◽  
Signal To Noise Ratio ◽  
Electron Gun ◽  
The Past ◽  
Analytical Electron ◽  
Analytical Electron Microscope ◽  
Scanning Electron

During the past ten years, the resolution of the CTEM has been improved to a theoretical value determined by spherical and diffraction aberrations. In the scanning electron microscope, however, the resolution is restricted by the signal-to-noise ratio. Crewe et al were the first to increase the resolution by applying a field emission source to a 35 kV scanning electron microscope, resulting in a 5 Å resolution. Owing to its prominent brightness, the feild emission electron gun promises to increase not only the resolution of STEM images, but also to realize an analytical electron microscope which identifies chemical elements, crystalline structures and chemical bonding in specimen microareas in the order of less than 100 Å.

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