Development of 200kV ultrahigh-resolution analytical electron microscope

1989 ◽  
Vol 47 ◽  
pp. 108-109
Author(s):  
T. Kaneyama ◽  
M. Naruse ◽  
Y. Ishida ◽  
M. Kersker
Keyword(s):  
Electron Microscope ◽  
Optical Constants ◽  
Materials Science ◽  
Objective Lens ◽  
The Finite Element Method ◽  
Ultrahigh Resolution ◽  
Analytical Electron ◽  
Analytical Electron Microscope ◽  
Characteristic Features ◽  
Better Than

In the field of materials science, the importance of the ultrahigh resolution analytical electron microscope (UHRAEM) is increasing. A new UHRAEM which provides a resolution of better than 0.2 nm and allows analysis of a few nm areas has been developed. [Fig. 1 shows the external view] The followings are some characteristic features of the UHRAEM.Objective lens (OL)Two types of OL polepieces (URP for ±10' specimen tilt and ARP for ±30' tilt) have been developed. The optical constants shown in the table on the next page are figures calculated by the finite element method. However, Cs was experimentally confirmed by two methods (namely, Beam Tilt method and Krivanek method) as 0.45 ∼ 0.50 mm for URP and as 0.9 ∼ 1.0 mm for ARP, respectively. Fig. 2 shows an optical diffractogram obtained from a micrograph of amorphous carbon with URP under the Scherzer defocus condition. It demonstrates a resolution of 0.19 nm and a Cs smaller than 0.5 mm.

Development of high-performance objective lens polepiece for ultrahigh resolution Analytical Electron Microscope

1993 ◽  
Vol 51 ◽  
pp. 254-255
Author(s):  
K. Fukushima ◽  
T. Kaneyama ◽  
F. Hosokawa ◽  
H. Tsuno ◽  
T. Honda ◽  
...  
Keyword(s):  
Electron Microscope ◽  
High Performance ◽  
Open Space ◽  
Materials Science ◽  
Objective Lens ◽  
Ultrahigh Resolution ◽  
Science Field ◽  
Specimen Holder ◽  
Analytical Electron ◽  
Analytical Electron Microscope

Recently, in the materials science field, the ultrahigh resolution analytical electron microscope (UHRAEM) has become a very important instrument to study extremely fine areas of the specimen. The requirements related to the performance of the UHRAEM are becoming gradually severer. Some basic characteristic features required of an objective lens are as follows, and the practical performance of the UHRAEM should be judged by totally evaluating them.1) Ultrahigh resolution to resolve ultrafine structure by atomic-level observation.2) Nanometer probe analysis to analyse the constituent elements in nm-areas of the specimen.3) Better performance of x-ray detection for EDS analysis, that is, higher take-off angle and larger detection solid angle.4) Higher specimen tilting angle to adjust the specimen orientation.To attain these requirements simultaneously, the objective lens polepiece must have smaller spherical and chromatic aberration coefficients and must keep enough open space around the specimen holder in it.

scholarly journals Development of a 300kV ultrahigh resolution analytical electron microscope

1991 ◽  
Vol 49 ◽  
pp. 350-351
Author(s):  
Kurio Fukushima ◽  
Yoshihiro Arai ◽  
Masahiro Kawasaki ◽  
Yasushi Kokubo
Keyword(s):  
Electron Microscope ◽  
Electron Gun ◽  
External View ◽  
Ultrahigh Resolution ◽  
Science Field ◽  
Heating And Cooling ◽  
Resolution Observation ◽  
Analytical Electron ◽  
Analytical Electron Microscope ◽  
Characteristic Features

Intended for atomic-level observation and analysis in the material science field, a 300 kV ultrahigh resolution analytical electron microscope (UHRAEM) has been newly developed on the basis of the JEM-2010, a 200 kV UHRAEM. There are two versions: the UHR version, intended for ultrahigh resolution observation with a point resolution of 0.17 nm and the multi-purpose HT version, featuring specimen tilt angles as large as± 40° , and heating and cooling holders. The external view of the instrument is shown in Fig.1. Some characteristic features of the 300 kV UHRAEM are shown as follows.Electron Gun: An extremely stable and compact 300 kV election gun is constructed with 10-stage accelerating tube. SF6 gas is used for electric insulation.

An Application of 200kV Ultrahigh Resolution Analytical Electron Microscope

1990 ◽  
Vol 48 (2) ◽  
pp. 98-99
Author(s):  
M. Suzuki ◽  
T. Kaneyama ◽  
E. Watanabe ◽  
M. Naruse ◽  
Y. Kokubo
Keyword(s):  
Electron Microscope ◽  
Spherical Aberration ◽  
Objective Lens ◽  
Theoretical Point ◽  
Ultrahigh Resolution ◽  
X Ray ◽  
Probe Current ◽  
Probe Size ◽  
Analytical Electron ◽  
Analytical Electron Microscope

A 200 kV ultrahigh resolution analytical electron microscope (UHRAEM), JEM-2010, enables both ultrahigh resolution imaging with a theoretical point resolution of 0.194 nm and nm-area analysis. In this paper, its preliminary data for x-ray analysis (Energy Dispersive X ray Spectroscopy: EDS) and its application data will be shown.An objective lens polepiece has been designed to minimize the spherical aberration coefficient (Cs) of the prefield and thereby increase the probe current in small probe size for nm-area EDS analysis. Measured values of Cs and chromatic aberration coefficient (Cc) are 0.5 mm and 1.0 mm, respectively. Fig. 1 shows a theoretical relation between the illumination angle and probe size of this objective lens on the assumption that the brightness of electrons is 6×106 A/cm2 • str in a LaB6 cathode. This calculation shows that an electron probe smaller than 1 nm in diameter is available even with a probe current of 10 pA.

Design of a 400KV Ultrahigh-Resolution Analytical TEM

1990 ◽  
Vol 48 (1) ◽  
pp. 134-135
Author(s):  
H. Tsuno ◽  
T. Honda ◽  
Y. Kokubo
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
Spherical Aberration ◽  
New Technology ◽  
Objective Lens ◽  
Ultrahigh Resolution ◽  
X Ray ◽  
Analytical Tem ◽  
Analytical Electron ◽  
Analytical Electron Microscope

The condenser-objective (C/O) lens proposed by Riecke, which has a very short gap length and small spherical aberration, was utilized for a commercial 200 kV ultrahigh resolution analytical TEM by Yanaka and Kaneyama. Fig. 1 shows the relation between theoretical resolution and objective lens (OL) spherical aberration coefficient (Cs) at accelerating voltages 200-1250 kV. It was reported that the Cs of a 400kV high resolution TEM is 1.0 mm and its resolution is 0.167 nm. The Cs of 400kV analytical TEM is 1.8 mm and the pre-field spherical aberration coefficient (Csp) is 1.8 mm. Fig. 2 (A), (B) show beam broading in specimens against the thickness when a 200kV and a 400kV electron beam transmit the specimen (C-Au), respectively. The broading of 400kV electron beam is about half of 200kV one. Then it is expected that spacial resolution of x-ray analysis improve. The above-captioned 400kV ultrahigh resolution analytical TEM is designed by applying a new technology which is adopted for a 200kV ultrahigh resolution analytical electron microscope, JEM-2010.Its fundamental construction is the same as the 400kV analytical electron microscope JEM-4000FX, except the 0L. The goniometer is a modified JEM-2010 goniometer, because it is too small for 400kV EM. Although it was expected that the focus ampere turn increases because of its short gap length, the objective lens coil used by JEM-4000EX/FX is adopted, because it has enough capacity. The shapes of the upper yoke and objective polepiece were calculated by the finite element method (55×110 Meshes) under the following condition: (1) maximum tilting-angle 10° (2) x-ray take-off angle 17.5° and solid angle 0.068 strad (3) minimized Cs.

Atomic resolution AEM (ARAEM) of oxide superconductors

1992 ◽  
Vol 50 (1) ◽  
pp. 74-75
Author(s):  
Vinayak P. Dravid ◽  
H. Zhang ◽  
L.D. Marks ◽  
J.P. Zhang
Keyword(s):  
Electron Microscope ◽  
Field Emission ◽  
Atomic Resolution ◽  
Oxide Superconductors ◽  
Electron Holography ◽  
Analytical Electron ◽  
Analytical Electron Microscope ◽  
Point To Point ◽  
Single Instrument ◽  
Better Than

A 200 kV cold field emission gun atomic resolution analytical electron microscope (ARAEM, Hitachi HF-2000) has been recently installed at Northwestern. The ARAEM offers an unprecedented combination of atomic structure imaging of better than 0.20 nm nominal point-to-point resolution and about 0.10 nm line resolution, alongwith nanoscale analytical capabilities and electron holography in one single instrument. The ARAEM has been fully functional/operational and this paper presents some illustrative examples of application of ARAEM techniques to oxide superconductors. Additional results will be presented at the meeting.

Field emission ultrahigh-resolution analytical electron microscope

1994 ◽  
Vol 54 (2-4) ◽  
pp. 132-144 ◽  
Author(s):  
T. Honda ◽  
T. Tomita ◽  
T. Kaneyama ◽  
Y. Ishida
Keyword(s):  
Electron Microscope ◽  
Field Emission ◽  
Ultrahigh Resolution ◽  
Analytical Electron ◽  
Analytical Electron Microscope

Comparison of Performance of an Analytical Electron Microscope at 300 and 100 kV

1984 ◽  
Vol 41 ◽  
Author(s):  
J. Bentley ◽  
E. A. Kenik ◽  
P. Angelini ◽  
A. T. Fisher ◽  
P. S. Sklad ◽  
...  
Keyword(s):  
Electron Microscope ◽  
Materials Science ◽  
Convergent Beam Electron Diffraction ◽  
Beam Electron ◽  
X Ray ◽  
Transmission Electron ◽  
Analytical Electron ◽  
Analytical Electron Microscope ◽  
Convergent Beam ◽  
Electron Energy Loss

AbstractPreliminary results on the performance of an analytical electron microscope (AEM) operating at 300 kV have been obtained and compared with the performance at 100 kV. Some features of the anticipated improvements for transmission electron microscopy (TEM) imaging, convergent beam electron diffraction (CBED), energy dispersive X-ray spectroscopy (EDS), and electron energy loss spectroscopy (EELS) have been studied from the aspect of materials science applications. The electron microscope used was a Philips EM430T operated with a LaB6 cathode and equipped with EDAX 9100/70 EDS and Gatan 607 EELS systems.

scholarly journals Development of a 300 kV ultrahigh resolution analytical electron microscope

1990 ◽  
Vol 1 (3) ◽  
pp. 233-240
Author(s):  
Yoshihiro Arai ◽  
Kurio Fukushima ◽  
Yasushi Kokubo ◽  
Alain Michot
Keyword(s):  
Electron Microscope ◽  
Ultrahigh Resolution ◽  
Analytical Electron ◽  
Analytical Electron Microscope

Energy-dispersive x-ray spectroscopy: A tutorial

1984 ◽  
Vol 42 ◽  
pp. 336-339
Author(s):  
Ernest L. Hall
Keyword(s):  
Electron Microscope ◽  
Materials Science ◽  
Biological Materials ◽  
Energy Dispersive ◽  
Current Status ◽  
Future Directions ◽  
X Ray ◽  
Analytical Electron ◽  
Analytical Electron Microscope ◽  
The Subject

The purpose of this paper is to present a tutorial review of the principles and practice of energy dispersive X-ray spectroscopy (EDXS) in the analytical electron microscope (AEM). Since this topic can only be treated here in the most cursory fashion, references which constitute a short bibliography on the subject are provided at the end of the paper. Excellent detailed summaries of the current status and future directions of EDXS in the AEM have been provided by Goldstein, Zaluzec, Williams, and Goldstein and Williams. In this paper, some of the important considerations for obtaining meaningful results from X-ray spectra will be described. Although all of the specific examples will be taken from materials science, this description applies equally to biological materials.

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