Electrical property of tantalum oxide films prepared by KrF excimer laser chemical vapor deposition

1994 ◽  
pp. 767-770
Author(s):  
M. Mukaida ◽  
Y. Imai ◽  
A. Watanabe ◽  
K. Osato ◽  
T. Kameyama ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Electrical Property ◽  
Excimer Laser ◽  
Vapor Deposition ◽  
Tantalum Oxide ◽  
Oxide Films ◽  
Chemical Vapor ◽  
Laser Chemical Vapor Deposition ◽  
Krf Excimer Laser

Stoichiometry of tantalum oxide films prepared by KrF excimer laser-induced chemical vapor deposition

1995 ◽  
Vol 261 (1-2) ◽  
pp. 76-82 ◽  
Author(s):  
Yoji Imai ◽  
Akio Watanabe ◽  
Masakazu Mukaida ◽  
Kazuo Osato ◽  
Tatsuo Tsunoda ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Excimer Laser ◽  
Vapor Deposition ◽  
Tantalum Oxide ◽  
Oxide Films ◽  
Chemical Vapor ◽  
Krf Excimer Laser
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