Coating of TiO2 thin films on particles by a plasma chemical vapor deposition process

2010 ◽  
Vol 21 (2) ◽  
pp. 136-140 ◽  
Author(s):  
Dong-Joo Kim ◽  
Jin-Yi Kang ◽  
Kyo-Seon Kim
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Chemical Vapor Deposition Process ◽  
Plasma Chemical ◽  
Tio2 Thin Films ◽  
Plasma Chemical Vapor Deposition ◽  
Vapor Deposition Process

ANN-Model for Plasma Chemical Vapor Deposition Process

2013 ◽  
Vol 699 ◽  
pp. 92-95
Author(s):  
Zhen Yu Li ◽  
Hong Sheng Li
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Chemical Vapor Deposition Process ◽  
Ann Model ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Process Gas ◽  
Vapor Deposition Process

Plasma Chemical Vapor Deposition process is one of the main process to make optical fiber core-rod. In this process, gas flow, pressure, furnace temperature, reflective microwave power , resonator moving speed and deposition rate are dependant aspects. An artificial neural network model is set up to describe the relationship of variables in the process, and also verified by the experiment and production. Based on the ANN-model, the process recipe setting is illustrated in the paper.

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