The control of graphene double-layer formation in copper-catalyzed chemical vapor deposition

Carbon ◽

10.1016/j.carbon.2012.03.041 ◽

2012 ◽

Vol 50 (10) ◽

pp. 3682-3687 ◽

Author(s):

Martin Kalbac ◽

Otakar Frank ◽

Ladislav Kavan

Keyword(s):

Chemical Vapor Deposition ◽

Double Layer ◽

Vapor Deposition ◽

Chemical Vapor ◽

Layer Formation

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Growth of Single-Walled Carbon Nanotubes by Hot-Filament Chemical Vapor Deposition at Low Temperatures Using Double-Layer Film Consisting of Nickel and Cobalt Layers as Catalyst

Hyomen Kagaku ◽

10.1380/jsssj.34.346 ◽

2013 ◽

Vol 34 (7) ◽

pp. 346-351

Author(s):

Yutaka ISHIKAWA ◽

Tomohiro UENO ◽

Ryo HARUTA

Keyword(s):

Carbon Nanotubes ◽

Chemical Vapor Deposition ◽

Double Layer ◽

Vapor Deposition ◽

Low Temperatures ◽

Chemical Vapor ◽

Single Walled Carbon Nanotubes ◽

Single Walled Carbon ◽

Hot Filament ◽

Walled Carbon Nanotubes

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Dual-gate low-voltage transparent electric-double-layer thin-film transistors with a top gate for threshold voltage modulation

RSC Advances ◽

10.1039/c9ra10619g ◽

2020 ◽

Vol 10 (14) ◽

pp. 8093-8096

Author(s):

Wei Dou ◽

Yuanyuan Tan

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Double Layer ◽

Vapor Deposition ◽

Electric Double Layer ◽

Thin Film Transistors ◽

Low Voltage ◽

Chemical Vapor ◽

Dual Gate ◽

Layer Thin Film

Dual gate (DG) low-voltage transparent electric-double-layer (EDL) thin-film transistors (TFTs) with microporous-SiO2 for both top and bottom dielectrics have been fabricated, both dielectrics were deposited by plasma-enhanced chemical vapor deposition (PECVD).

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Direct growth of large area uniform double layer graphene films on MgO(100) substrates by chemical vapor deposition

Materials Chemistry and Physics ◽

10.1016/j.matchemphys.2019.05.067 ◽

2019 ◽

Vol 233 ◽

pp. 213-219 ◽

Author(s):

Junjie Luo ◽

Jing Wang ◽

Feifei Xia ◽

Xintang Huang

Keyword(s):

Chemical Vapor Deposition ◽

Double Layer ◽

Vapor Deposition ◽

Chemical Vapor ◽

Layer Graphene ◽

Graphene Films ◽

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Relaxed Ge x Si 1−x layer formation with reduced dislocation density grown by ultrahigh vacuum chemical vapor deposition

Applied Physics A ◽

10.1007/s003390051065 ◽

2000 ◽

Vol 70 (4) ◽

pp. 449-451 ◽

Author(s):

G.L. Luo ◽

P.Y. Chen ◽

X.F. Lin ◽

P. Tsien ◽

T.W. Fan

Keyword(s):

Chemical Vapor Deposition ◽

Dislocation Density ◽

Vapor Deposition ◽

Ultrahigh Vacuum ◽

Chemical Vapor ◽

Layer Formation

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Application of plasma enhanced chemical vapor deposition silicon nitride as a double layer antireflection coating and passivation layer for polysilicon solar cells

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580509 ◽

1997 ◽

Vol 15 (3) ◽

pp. 1020-1025 ◽

Author(s):

S. Winderbaum ◽

F. Yun ◽

O. Reinhold

Keyword(s):

Solar Cells ◽

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Double Layer ◽

Vapor Deposition ◽

Chemical Vapor ◽

Antireflection Coating ◽

Passivation Layer

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SiN$_{x}$ Double Layer Antireflection Coating by Plasma-Enhanced Chemical Vapor Deposition for Single Crystalline Silicon Solar Cells

Japanese Journal of Applied Physics ◽

10.1143/jjap.50.08ke01 ◽

2011 ◽

Vol 50 (8) ◽

pp. 08KE01 ◽

Author(s):

Daeyeong Gong ◽

Youn-Jung Lee ◽

Minkyu Ju ◽

Jisoo Ko ◽

Doohwan Yang ◽

...

Keyword(s):

Solar Cells ◽

Chemical Vapor Deposition ◽

Double Layer ◽

Vapor Deposition ◽

Crystalline Silicon ◽

Chemical Vapor ◽

Antireflection Coating ◽

Silicon Solar Cells ◽

Single Crystalline Silicon ◽

Crystalline Silicon Solar Cells

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Preparation of a double-layer YBa2Cu3O7-x/CeO2 film on a Hastelloy C276 metal substrate with buffer layers of LaMnO3/MgO/Gd2Zr2O7 by laser chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2018.07.027 ◽

2018 ◽

Vol 662 ◽

pp. 33-40 ◽

Author(s):

Pei Zhao ◽

Wei Wu ◽

Qiong Zhang ◽

Rui-Bo Jin ◽

Yuan Lai Xu ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Double Layer ◽

Vapor Deposition ◽

Chemical Vapor ◽

Metal Substrate ◽

Buffer Layers ◽

Laser Chemical Vapor Deposition ◽

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Graphene Layer Formation on Polycrystalline Nickel Grown by Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.7567/jjap.52.035103 ◽

2013 ◽

Vol 52 (3R) ◽

pp. 035103 ◽

Author(s):

Kenichi Kanzaki ◽

Hiroki Hibino ◽

Toshiki Makimoto

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Graphene Layer ◽

Chemical Vapor ◽

Layer Formation ◽

Polycrystalline Nickel

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Formation of Erbia-Yttria double layer fabricated by metal organic chemical vapor deposition process with changing oxygen flow rates

Thin Solid Films ◽

10.1016/j.tsf.2019.137455 ◽

2019 ◽

Vol 689 ◽

pp. 137455 ◽

Author(s):

Seungwon Lee ◽

Kenji Matsuda ◽

Masaki Tanaka ◽

Taiki Tsuchiya ◽

Katsuhiko Nishimura ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Double Layer ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Organic Chemical ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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The interfacial layer formation of the Al2O3/Si structures grown by low‐pressure metalorganic chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.355224 ◽

1993 ◽

Vol 74 (1) ◽

pp. 760-762 ◽

Author(s):

T. W. Kim ◽

W. N. Kang ◽

Y. S. Yoon ◽

S. S. Yom ◽

J. Y. Lee ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Interfacial Layer ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Layer Formation ◽

Metalorganic Chemical

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