Analysis of mechanical properties of N2 in situ doped polycrystalline 3C-SiC thin films by chemical vapor deposition using single-precursor hexamethyildisilane

Chemical vapor deposition (CVD) of titanium oxide films has been performed for the first time under ultra-high vacuum (UHV) conditions. The films were deposited through the pyrolysis reaction of titanium isopropoxide, Ti(OPri)4, and in situ characterized by x-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES). A small amount of C incorporation was observed during the initial stages of deposition, through the interaction of precursor molecules with the bare Si substrate. Subsequent deposition produces pure and stoichiometric TiO2 films. Si–O bond formation was detected in the film-substrate interface. Deposition rate was found to increase with the substrate temperature. Ultra-high vacuum chemical vapor deposition (UHV-CVD) is especially useful to study the initial stages of the CVD processes, to prepare ultra-thin films, and to investigate the composition of deposited films without the interference from ambient impurities.

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In Situ Growth of Carbon Nanotubes in Hydroxyapatite Matrix by Chemical Vapor Deposition

Advanced Materials Research ◽

10.4028/www.scientific.net/amr.79-82.1671 ◽

2009 ◽

Vol 79-82 ◽

pp. 1671-1674 ◽

Cited By ~ 4

Author(s):

Xiao Ying Lu ◽

Hao Wang ◽

Sheng Yi Xia ◽

Jian Xin Wang ◽

Jie Weng

Keyword(s):

Mechanical Properties ◽

Carbon Nanotubes ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Biomedical Applications ◽

Chemical Vapor ◽

Novel Method ◽

Biomedical Fields ◽

Walled Cnts

Carbon nanotubes (CNTs)/hydroxyapatite (HA) nanocomposites have been successfully fabricated by a novel method for the biomedical applications, which is in situ growing CNTs in HA matrix in a chemical vapor deposition (CVD) system. The results show that it is feasible to in situ grow CNTs in HA matrix by CVD for the fabrication of CNTs/HA nanocomposites. Multi-walled CNTs with 50-80 nm in diameter have been grown in situ from HA matrix with the pretreatment of sintering at 1473K in air. The nanocomposites are composed with carbon crystals in CNTs form, HA crystallites and calcium phosphate crystallites, one of most important CaP bioceramics. And the CNTs content is about 1% proportion by weight among the composites in our experiments, which can enhance the HA mechanical properties and the CNTs content does not affect the HA performances. These CNTs/HA nanocomposites have the potential application in the biomedical fields.

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In Situ Heteroepitaxial Bi2Sr2CaCu2O8 Thin Films Prepared by Metalorganic Chemical Vapor Deposition

MRS Proceedings ◽

10.1557/proc-335-285 ◽

1993 ◽

Vol 335 ◽

Author(s):

Frank Dimeo ◽

Bruce W. Wessels ◽

Deborah A. Neumayer ◽

Tobin J. Marks ◽

Jon L. Schindler ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Oxide Phase ◽

Growth Conditions ◽

X Ray Diffraction ◽

Metalorganic Chemical

AbstractBi2Sr2CaCu2O8 thin films have been prepared in situ by low pressure metalorganic chemical vapor deposition using fluorinated β–diketonate precursors. The influence of the growth conditions on the oxide phase stability and impurity phase formation was examined as well as the superconducting properties of the films. Thin films deposited on LaAIO3 substrates were epitaxial as confirmed by x-ray diffraction measurements, including θ-2θ and φ scans. Four probe resistivity measurements showed the films to be superconducting with a maximum Tc0 of 90 K without post annealing. This Tc0 is among the highest reported for thin films of the BSCCO (2212) phase, and approaches reported bulk values.

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In situ single-liquid-source metal-organic chemical vapor deposition of (La0.8Ca0.2)MnO3 giant magnetoresistive films

Journal of Materials Research ◽

10.1557/jmr.1995.2166 ◽

1995 ◽

Vol 10 (9) ◽

pp. 2166-2169 ◽

Cited By ~ 26

Author(s):

Y.Q. Li ◽

J. Zhang ◽

S. Pombrik ◽

S. DiMascio ◽

W. Stevens ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Organic Solution ◽

Liquid Source ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

A large magnetoresistance change (ΔR/RH) of −550% has been observed at 270 K in (La0.8Ca0.2)MnO3 thin films. The films were prepared in situ on LaAlO3 substrates by single-liquid-source metal-organic chemical vapor deposition. M(thd)n (M = La, Ca, and Mn, and n = 2, 3) were dissolved together in an organic solution and used as precursors for the deposition of (La0.8Ca0.2)MnO3 thin films. Deposition was conducted at an oxygen partial pressure of 1.2 Torr and a substrate temperature ranging from 600 °C to 700 °C. The mechanism for the large magnetoresistance change in this manganese oxide is briefly discussed.

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