Plasma influence on the properties and structure of indium tin oxide films produced by reactive middle frequency pulsed magnetron sputtering
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2001 ◽
Vol 40
(Part 1, No. 5A)
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pp. 3364-3369
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2008 ◽
Vol 58
(3)
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pp. 203-206
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2009 ◽
Vol 27
(4)
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pp. 643-647
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