Plasma influence on the properties and structure of indium tin oxide films produced by reactive middle frequency pulsed magnetron sputtering

2006 ◽  
Vol 496 (2) ◽  
pp. 197-204 ◽  
Author(s):  
A. Rogozin ◽  
M. Vinnichenko ◽  
N. Shevchenko ◽  
A. Kolitsch ◽  
W. Möller
2001 ◽  
Vol 40 (Part 1, No. 5A) ◽  
pp. 3364-3369 ◽  
Author(s):  
Wenli Deng ◽  
Taizo Ohgi ◽  
Hitoshi Nejo ◽  
Daisuke Fujita

2008 ◽  
Vol 58 (3) ◽  
pp. 203-206 ◽  
Author(s):  
Bo Zhang ◽  
Xianping Dong ◽  
Xiaofeng Xu ◽  
Jiansheng Wu

1995 ◽  
Vol 257 (1) ◽  
pp. 32-35 ◽  
Author(s):  
R.N. Joshi ◽  
V.P. Singh ◽  
J.C. McClure

2015 ◽  
Vol 24 (11) ◽  
pp. 117703 ◽  
Author(s):  
Jin-Hua Gu ◽  
Jia-Le Si ◽  
Jiu-Xiu Wang ◽  
Ya-Yang Feng ◽  
Xiao-Yong Gao ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document