Selective area etching of III–V semiconductors using TDMAAs and TDMASb in metalorganic molecular beam epitaxy chamber

1997 ◽  
Vol 175-176 ◽  
pp. 1236-1241 ◽  
Author(s):  
K. Yamamoto ◽  
H. Asahi ◽  
T. Hayashi ◽  
K. Hidaka ◽  
S. Gonda
1996 ◽  
Vol 35 (Part 1, No. 7) ◽  
pp. 3814-3818 ◽  
Author(s):  
Toshihiko Hayashi ◽  
Hajime Asahi ◽  
Kazuhiko Yamamoto ◽  
Ken-ichi Hidaka ◽  
Shun-ichi Gonda

2000 ◽  
Vol 39 (Part 2, No. 11A) ◽  
pp. L1081-L1083 ◽  
Author(s):  
Jun Suda ◽  
Tatsuro Kurobe ◽  
Shigeru Nakamura ◽  
Hiroyuki Matsunami

1994 ◽  
Vol 136 (1-4) ◽  
pp. 250-255 ◽  
Author(s):  
X.F. Liu ◽  
H. Asahi ◽  
Y. Okuno ◽  
D. Marx ◽  
K. Inoue ◽  
...  

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