Magnetic behavior of oxidized iron thin films prepared by sputtering at very low temperatures

2001 ◽  
Vol 482-485 ◽  
pp. 1095-1100 ◽  
Author(s):  
A. Muñoz-Martı́n ◽  
C. Prieto ◽  
C. Ocal ◽  
J.L. Martı́nez ◽  
J. Colino
2007 ◽  
Vol 101 (11) ◽  
pp. 113914 ◽  
Author(s):  
F. Jiménez-Villacorta ◽  
Y. Huttel ◽  
A. Muñoz-Martín ◽  
C. Ballesteros ◽  
E. Román ◽  
...  

2006 ◽  
Vol 26 (5-7) ◽  
pp. 1141-1145 ◽  
Author(s):  
F. Jiménez-Villacorta ◽  
A. Muñoz-Martín ◽  
R. Ramírez ◽  
C. Prieto

2000 ◽  
Vol 43 (10) ◽  
pp. 919-923 ◽  
Author(s):  
A Muñoz-Martı́n ◽  
C Prieto ◽  
C Ocal ◽  
J.L Martı́nez

1988 ◽  
Vol 49 (C8) ◽  
pp. C8-1753-C8-1754
Author(s):  
H. Sakakima ◽  
M. Tessier ◽  
R. Krishnan ◽  
E. Hirota

2021 ◽  
Vol 27 (S1) ◽  
pp. 2660-2662
Author(s):  
David Elam ◽  
Eduardo Ortega ◽  
Andrey Chabanov ◽  
Arturo Ponce

1997 ◽  
Vol 12 (5) ◽  
pp. 1176-1178 ◽  
Author(s):  
A. T. Chien ◽  
J. S. Speck ◽  
F. F. Lange

Pb(ZrxTi1−x)O3 and PbZrO3 heteroepitaxial thin films were produced in an aqueous solution (10 M KOH) at ambient pressure and low temperatures (90–150 °C) on (001) SrTiO3 and LaAlO3 single crystal substrates. Growth of the Pb(ZrxTi1−x)O3 and PbZrO3 thin films initiates by the formation of {100} faceted islands. Energy dispersive spectroscopy (EDS) analysis of the Pb(ZrxTi1−x)O3 thin film shows that the Zr: Ti ratio is 45: 56, nearly identical to the molar ratio of the precursors. This route might provide a viable low temperature alternative for the formation of high dielectric constant thin films for applications such as dynamic random access memory (DRAM).


2020 ◽  
Author(s):  
A. Amali Roselin ◽  
N. Anandhan ◽  
I. Joseph Paneer Doss ◽  
G. Gopu ◽  
K. P. Ganesan ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document