Growth and characterization of 3C-SiC films on Si substrates by reactive magnetron sputtering; effects of CH 4 partial pressure on the crystalline quality, structure and stoichiometry

Crystalline Quality ◽

Reactive Magnetron ◽

Si Substrates ◽

Sic Films

Fabrication and characterization of MOS devices on 3CSiC films grown by reactive magnetron sputtering on Si(111) substrates

Thin Solid Films ◽

10.1016/s0040-6090(96)08788-3 ◽

1996 ◽

Vol 287 (1-2) ◽

pp. 252-257 ◽

Cited By ~ 8

Author(s):

Q. Wahab ◽

R. Turan ◽

L. Hultman ◽

M. Willander ◽

J.-E. Sundgren

Keyword(s):

Magnetron Sputtering ◽

Reactive Magnetron ◽

Mos Devices ◽

Fabrication And Characterization ◽

Sic Films

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

Characterization of ferroelectric hafnium/zirconium oxide solid solutions deposited by reactive magnetron sputtering

10.1116/1.5060643 ◽

2019 ◽

Vol 37 (2) ◽

pp. 021203 ◽

Cited By ~ 7

Author(s):

Jordan Bouaziz ◽

Pedro Rojo Romeo ◽

Nicolas Baboux ◽

Bertrand Vilquin

Keyword(s):

Magnetron Sputtering ◽

Solid Solutions ◽

Zirconium Oxide ◽

Characterization of composite SiOx/polymer films deposited on pet substrates by RF reactive magnetron sputtering

Vacuum ◽

10.1016/j.vacuum.2012.02.035 ◽

2013 ◽

Vol 89 ◽

pp. 109-112 ◽

Cited By ~ 3

Author(s):

Zhuang Liu ◽

Xinxin Ma ◽

ChunLi Yang ◽

Fangjun Xu

Keyword(s):

Magnetron Sputtering ◽

Polymer Films ◽

Hardness and structure characterization of films produced by reactive magnetron sputtering on a conventional austenitic stainless steel

Microelectronics Journal ◽

10.1016/j.mejo.2008.01.047 ◽

2008 ◽

Vol 39 (11) ◽

pp. 1329-1330 ◽

Cited By ~ 4

Author(s):

Carlos M. Garzón ◽

José E. Alfonso ◽

Edna C. Corredor ◽

Abel A. Recco ◽

André P. Tschiptschin

Keyword(s):

Stainless Steel ◽

Austenitic Stainless Steel ◽

Magnetron Sputtering ◽

Structure Characterization ◽

Growth and Characterization of Tungsten Oxide Thin Films using the Reactive Magnetron Sputtering System

Journal of Inorganic and Organometallic Polymers and Materials ◽

10.1007/s10904-016-0380-0 ◽

2016 ◽

Vol 26 (4) ◽

pp. 889-894 ◽

Cited By ~ 8

Author(s):

S. Firoozbakht ◽

E. Akbarnejad ◽

A. Salar Elahi ◽

M. Ghoranneviss

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Tungsten Oxide ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

Tungsten Oxide Thin Films ◽

Sputtering System

Growth and characterization of NiO thin films prepared by dc reactive magnetron sputtering

Solid State Sciences ◽

10.1016/j.solidstatesciences.2010.11.019 ◽

2011 ◽

Vol 13 (2) ◽

pp. 314-320 ◽

Cited By ~ 21

Author(s):

A. Mallikarjuna Reddy ◽

A. Sivasankar Reddy ◽

Kee-Sun Lee ◽

P. Sreedhara Reddy

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Reactive Magnetron ◽

Dc Reactive Magnetron Sputtering

Oxygen Partial Pressure Dependence of the Properties of TiO2 Thin Films Deposited by DC Reactive Magnetron Sputtering

Procedia Engineering ◽

10.1016/j.proeng.2012.01.1326 ◽

2012 ◽

Vol 32 ◽

pp. 676-682 ◽

Cited By ~ 32

Author(s):

M. Horprathum ◽

P. Eiamchai ◽

P. Chindaudom ◽

A. Pokaipisit ◽

P. Limsuwan

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Oxygen Partial Pressure ◽

Partial Pressure ◽

Pressure Dependence ◽

Reactive Magnetron ◽

Tio2 Thin Films ◽

Dc Reactive Magnetron Sputtering

Characterization of titanium nitride films prepared by d.c. reactive magnetron sputtering at different nitrogen pressures

Surface and Coatings Technology ◽

10.1016/s0257-8972(96)03094-0 ◽

1997 ◽

Vol 90 (1-2) ◽

pp. 64-70 ◽

Cited By ~ 52

Author(s):

Li-Jian Meng ◽

M.P. dos Santos

Keyword(s):

Magnetron Sputtering ◽

Titanium Nitride ◽

Microhardness characterization of superlattices formed by reactive magnetron sputtering and ion beam assisted deposition

Surface and Coatings Technology ◽

10.1016/s0257-8972(02)00244-x ◽

2002 ◽

Vol 158-159 ◽

pp. 685-689 ◽

Cited By ~ 7

Author(s):

E Blando ◽

R Hübler

Keyword(s):

Magnetron Sputtering ◽

Ion Beam ◽

Reactive Magnetron ◽

Ion Beam Assisted Deposition

Synthesis and characterization of La 2 NiO 4+δ coatings deposited by reactive magnetron sputtering using plasma emission monitoring

Solid State Ionics ◽

10.1016/j.ssi.2014.07.017 ◽

2014 ◽

Vol 265 ◽

pp. 73-79 ◽

Cited By ~ 7

Author(s):

J. Fondard ◽

A. Billard ◽

G. Bertrand ◽

P. Briois

Keyword(s):

Magnetron Sputtering ◽

Synthesis And Characterization ◽

Plasma Emission ◽

Reactive Magnetron ◽

Emission Monitoring