Electrical and structural properties of low temperature boron- and phosphorus-doped polycrystalline silicon thin films prepared by ECR-CVD

1999 ◽  
Vol 142 (1-4) ◽  
pp. 400-406 ◽  
Author(s):  
H.L Hsiao ◽  
Y.Y Shieh ◽  
R.S Lee ◽  
R.Y Wang ◽  
K.C Wang ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Structural Properties ◽  
Polycrystalline Silicon ◽  
Silicon Thin Films ◽  
Phosphorus Doped

scholarly journals Effect of Halogen on the Structure of Low Temperature Polycrystalline Silicon Thin Films Fabricated on Glass Substrates.

1999 ◽  
Vol 107 (1251) ◽  
pp. 1099-1104 ◽  
Author(s):  
Toshio KAMIYA ◽  
Yoshiteru MAEDA ◽  
Kouichi NAKAHATA ◽  
Takashi KOMARU ◽  
Charles M. FORTMANN ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Polycrystalline Silicon ◽  
Glass Substrates ◽  
Silicon Thin Films

Boron- and phosphorus-doped polycrystalline silicon thin films prepared by silver-induced layer exchange

2013 ◽  
Vol 102 (21) ◽  
pp. 212102 ◽  
Author(s):  
T. Antesberger ◽  
T. A. Wassner ◽  
C. Jaeger ◽  
M. Algasinger ◽  
M. Kashani ◽  
...  
Keyword(s):  
Thin Films ◽  
Polycrystalline Silicon ◽  
Silicon Thin Films ◽  
Phosphorus Doped

Enhanced hydrogenation in polycrystalline silicon thin films using low‐temperature ultrasound treatment

1996 ◽  
Vol 68 (20) ◽  
pp. 2873-2875 ◽  
Author(s):  
S. Ostapenko ◽  
L. Jastrzebski ◽  
J. Lagowski ◽  
R. K. Smeltzer
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Polycrystalline Silicon ◽  
Ultrasound Treatment ◽  
Silicon Thin Films

Growth and physical properties of in situ phosphorus-doped RTLPCVD polycrystalline silicon thin films

1998 ◽  
Vol 1 (3-4) ◽  
pp. 299-302 ◽  
Author(s):  
S Kallel ◽  
B Semmache ◽  
M Lemiti ◽  
Ch Dubois ◽  
H Jaffrezic ◽  
...  
Keyword(s):  
Thin Films ◽  
Physical Properties ◽  
Polycrystalline Silicon ◽  
Silicon Thin Films ◽  
Phosphorus Doped
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