Direct Observation of Plasma-Stimulated Activation of Surface Species Using Multimodal In Situ/Operando Spectroscopy Combining Polarization-Modulation Infrared Reflection-Absorption Spectroscopy, Optical Emission Spectroscopy, and Mass Spectrometry

2021 ◽  
Author(s):  
Garam Lee ◽  
David B. Go ◽  
Casey P. O’Brien
Keyword(s):  
Mass Spectrometry ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Polarization Modulation ◽  
Surface Species ◽  
Infrared Reflection Absorption Spectroscopy ◽  
Infrared Reflection ◽  
Spectroscopy Optical

scholarly journals Machine Learning Prediction of Electron Density and Temperature from Optical Emission Spectroscopy in Nitrogen Plasma

Coatings ◽  
2021 ◽  
Vol 11 (10) ◽  
pp. 1221
Author(s):  
Jun-Hyoung Park ◽  
Ji-Ho Cho ◽  
Jung-Sik Yoon ◽  
Jung-Ho Song
Keyword(s):  
Machine Learning ◽  
Electron Temperature ◽  
Real Time ◽  
Electron Density ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Plasma Parameters ◽  
Plasma Nitridation

We present a non-invasive approach for monitoring plasma parameters such as the electron temperature and density inside a radio-frequency (RF) plasma nitridation device using optical emission spectroscopy (OES) in conjunction with multivariate data analysis. Instead of relying on a theoretical model of the plasma emission to extract plasma parameters from the OES, an empirical correlation was established on the basis of simultaneous OES and other diagnostics. Additionally, we developed a machine learning (ML)-based virtual metrology model for real-time Te and ne monitoring in plasma nitridation processes using an in situ OES sensor. The results showed that the prediction accuracy of electron density was 97% and that of electron temperature was 90%. This method is especially useful in plasma processing because it provides in-situ and real-time analysis without disturbing the plasma or interfering with the process.

Performance control for amorphous silicon germanium alloys by in situ optical emission spectroscopy

2018 ◽  
Vol 659 ◽  
pp. 36-40 ◽  
Author(s):  
Guanghong Wang ◽  
Chengying Shi ◽  
Lei Zhao ◽  
Libin Mo ◽  
Hongwei Diao ◽  
...  
Keyword(s):  
Amorphous Silicon ◽  
Silicon Germanium ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Performance Control ◽  
Amorphous Silicon Germanium ◽  
Silicon Germanium Alloys

Study of oxygen/tetraethoxysilane plasmas in a helicon reactor using optical emission spectroscopy and mass spectrometry

2000 ◽  
Vol 9 (3) ◽  
pp. 331-339 ◽  
Author(s):  
K Aumaille ◽  
A Granier ◽  
M Schmidt ◽  
B Grolleau ◽  
C Vallée ◽  
...  
Keyword(s):  
Mass Spectrometry ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission

Correlation Between In Situ Optical Emission Spectroscopy in a Reactive O2 / AR RF Magnetron Sputtering Discharge and PZT Thin Film Composition

1997 ◽  
Vol 493 ◽  
Author(s):  
F. Ayguavives ◽  
P. Aubert ◽  
B. Ea-Kim ◽  
B. Agius
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Rf Magnetron Sputtering ◽  
Nuclear Reaction Analysis ◽  
Nominal Composition ◽  
Film Composition

ABSTRACTLead zirconate titanate (PZT) thin films have been grown by rf magnetron sputtering on Si substrates from a metallic target of nominal composition Pb1.1(Zr0.4 Ti0.6 in a reactive argon / oxygen gas mixture. During plasma deposition, in situ Optical Emission Spectroscopy (OES) measurements show clearly a correlation between the evolution of characteristic atomic emission line intensities (Zr - 386.4 nm, Ti - 399.9 nm, Pb - 405.8 nm and O - 777.2 nm) and the thin-film composition determined by a simultaneous use of Rutherford Backscattering Spectroscopy (RBS) and Nuclear Reaction Analysis (NRA).

Characterization of two modes in a dielectric barrier discharge probe by optical emission spectroscopy and time-of-flight mass spectrometry

2015 ◽  
Vol 30 (12) ◽  
pp. 2496-2506 ◽  
Author(s):  
Andreas Bierstedt ◽  
Ulrich Panne ◽  
Knut Rurack ◽  
Jens Riedel
Keyword(s):  
Mass Spectrometry ◽  
Dielectric Barrier Discharge ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Barrier Discharge ◽  
Optical Emission ◽  
Dielectric Barrier ◽  
Flight Mass Spectrometry ◽  
Individual Product

A dielectric barrier discharge probe has been developed, which enables switching between two individual product channels yielding either protonated or ammoniated molecules.

The utility of polarization modulation infrared reflection absorption spectroscopy (PM-IRRAS) in surface and in situ studies: new data processing and presentation approach

The Analyst ◽  
2018 ◽  
Vol 143 (11) ◽  
pp. 2563-2573 ◽  
Author(s):  
Evans A. Monyoncho ◽  
Vlad Zamlynny ◽  
Tom K. Woo ◽  
Elena A. Baranova
Keyword(s):  
Infrared Spectroscopy ◽  
Data Processing ◽  
Absorption Spectroscopy ◽  
Organic Molecules ◽  
Polarization Modulation ◽  
In Situ Studies ◽  
Infrared Reflection Absorption Spectroscopy ◽  
Infrared Reflection ◽  
Non Destructive

Infrared spectroscopy is a powerful non-destructive technique for the identification and quantification of organic molecules widely used in scientific studies.

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