scholarly journals The Surface Chemistry of Propylene, 1-Iodopropane, and 1,3-Diiodopropane on MoAl Alloy Thin Films Formed on Dehydroxylated Alumina

2006 ◽  
Vol 110 (25) ◽  
pp. 12555-12571 ◽  
Author(s):  
Feng Gao ◽  
Yilin Wang ◽  
W. T. Tysoe
Keyword(s):  
Thin Films ◽  
Surface Chemistry

Plant-inspired quercetin thin films: universal coatings and their postfunctionalization for non-biofouling applications

2021 ◽  
Author(s):  
Soojeong Cho ◽  
Hyeon Min Shin ◽  
Yeonwoo Jeong ◽  
Sunhee Kim ◽  
Ji Hwan Eom ◽  
...  
Keyword(s):  
Thin Films ◽  
Surface Chemistry

We developed quercetin surface chemistry that can be applied for various substrates and is able to postfunctionalize for hemocompatible coatings.

scholarly journals Role of oligomer structures in the surface chemistry of amidinate metal complexes used for atomic layer deposition of thin films

2019 ◽  
Vol 35 (7) ◽  
pp. 720-731 ◽  
Author(s):  
Jonathan Guerrero-Sánchez ◽  
Bo Chen ◽  
Noboru Takeuchi ◽  
Francisco Zaera
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Surface Chemistry ◽  
Metal Complexes ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Image Position

Abstract

Surface Modification of a-C:H(N) Thin Films by Plasma Treatment

2005 ◽  
Vol 11 (S03) ◽  
pp. 162-165 ◽  
Author(s):  
L. von Mühlen ◽  
R. A. Simao ◽  
C. A. Achete
Keyword(s):  
Thin Films ◽  
Surface Roughness ◽  
Optical Properties ◽  
Surface Modification ◽  
Surface Chemistry ◽  
Plasma Treatment ◽  
Surface Properties ◽  
Functional Groups ◽  
Material Properties ◽  
Modify Surface

Surface chemistry and topography of materials are generally preponderant factors in a series of material properties, such as adhesion, wettability, friction and optical properties [1]. Wettability of films, for example, can be altered significantly by modifying its surface roughness and also by incorporating functional groups. Plasma treatment is a powerful and versatile way to modify surface properties of amorphous nitrogen-incorporated carbon thin films (a-C:H(N)) and obtain materials with improved properties, once it is possible to modify the surfaces in a controlled way by specific settings of plasma conditions. [2 - 4]

Influence of Si substrate preparation on surface chemistry and morphology of L-CVD SnO2 thin films studied by XPS and AFM

2010 ◽  
Vol 256 (19) ◽  
pp. 5771-5775 ◽  
Author(s):  
M. Kwoka ◽  
L. Ottaviano ◽  
N. Waczyńska ◽  
S. Santucci ◽  
J. Szuber
Keyword(s):  
Thin Films ◽  
Surface Chemistry ◽  
Si Substrate ◽  
Substrate Preparation ◽  
Sno2 Thin Films
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