The impact of erbium incorporation on the structure and photophysics of silicon–germanium nanowires

Nanoscale ◽  
2010 ◽  
Vol 2 (12) ◽  
pp. 2657 ◽  
Author(s):  
Ji Wu ◽  
Monika Wieligor ◽  
T. Waldek Zerda ◽  
Jeffery L. Coffer
2016 ◽  
Vol 119 (15) ◽  
pp. 155101 ◽  
Author(s):  
S. Sarikurt ◽  
A. Ozden ◽  
A. Kandemir ◽  
C. Sevik ◽  
A. Kinaci ◽  
...  

Author(s):  
Iyyappa Rajan Panneerselvam ◽  
Pranay Chakraborty ◽  
qiong nian ◽  
Yongfeng Lu ◽  
Yiliang Liao ◽  
...  

Abstract The rational design of the electronic band structures and the associated properties (e.g., optical) of advanced materials has remained challenging for crucial applications in optoelectronics, solar desalination, advanced manufacturing technologies, etc. In this work, using first-principles calculations, we studied the prospects of tuning the absorption spectra of graphene via defect engineering, i.e., chemical doping and oxidation. Our computational analysis shows that graphene functionalization with single hydroxyl and carboxylic acid fails to open a band gap in graphene. While single epoxide functionalization successfully opens a bandgap in graphene and increases absorptivity, however, other optical properties such as reflection, transmission, and dielectric constants are significantly altered. Boron and nitrogen dopants lead to p- and n-type doping, respectively, while fluorine dopants or a single-carbon atomic vacancy cannot create a significant bandgap in graphene. By rigorously considering the spin-polarization effect, we find that titanium, zirconium, and hafnium dopants can create a bandgap in graphene via an induced flat band around the Fermi level as well as the collapse of the Dirac cone. In addition, silicon, germanium, and tin dopants are also effective in improving the optical characteristics. Our work is important for future experimental work on graphene for laser and optical processing applications.


2012 ◽  
Vol 1408 ◽  
Author(s):  
Houssem Kallel ◽  
Abdallah Chehaidar ◽  
Arnaud Arbouet ◽  
Thierry Baron ◽  
Alexis Potié ◽  
...  

ABSTRACTSilicon and Germanium nanowires (NWs) have shown a strong ability to enhance both the absorption and scattering of light. Tailoring the optical properties of Si or Ge NWs can be obtained by adjusting the nanowire diameter. Another parameter that can be used is the chemical composition of silicon-germanium (Si1-xGex-NWs) alloys. In this work, we perform a numerical study on the optical properties of single Si1-xGex-NWs based on the Lorenz-Mie theory. The effects of Ge composition, light polarization and angle of incidence on the nanowire optical properties are investigated.


2020 ◽  
Vol 98 (2) ◽  
pp. 13-28
Author(s):  
Leonid Tsybeskov ◽  
Theodore I Kamins ◽  
Xiaohua Wu ◽  
David J. Lockwood

2009 ◽  
Vol 1166 ◽  
Author(s):  
Sabah Bux ◽  
Jean-Pierre Fleurial ◽  
Richard G. Blair ◽  
Pawan K. Gogna ◽  
Thierry Caillat ◽  
...  

AbstractPoint defect scattering via the formation of solid solutions to reduce the lattice thermal conductivity has been an effective method for increasing ZT in state-of-the-art thermoelectric materials such as Si-Ge, Bi2Te3-Sb2Te3 and PbTe-SnTe. However, increases in ZT are limited by a concurrent decrease in charge carrier mobility values. The search for effective methods for decoupling electronic and thermal transport led to the study of low dimensional thin film and wire structures, in particular because scattering rates for phonons and electrons can be better independently controlled. While promising results have been achieved on several material systems, integration of low dimensional structures into practical power generation devices that need to operate across large temperature differential is extremely challenging. We present achieving similar effects on the bulk scale via high pressure sintering of doped and undoped Si and Si-Ge nanoparticles. The nanoparticles are prepared via techniques that include high energy ball milling of the pure elements. The nanostructure of the materials is confirmed by powder X-ray diffraction, transmission electron microscopy, scanning electron microscopy, and dynamic light scattering. Thermal conductivity measurements on the densified pellets show a drastic 90% reduction in the lattice contribution at room temperature when compared to doped single crystal Si. Additionally, Hall effect measurements show a much more limited degradation in the carrier mobility. The combination of low thermal conductivity and high power factor in heavily doped n-type nanostructured bulk Si leads to an unprecedented increase in ZT at 1275 K by a factor of 3.5 over that of single crystalline samples. Experimental results on both n-type and p-type Si are discussed in terms of the impact of the size distribution of the nanoparticles, doping impurities and nanoparticle synthesis processes.


2010 ◽  
Vol 1267 ◽  
Author(s):  
Sabah Bux ◽  
Richard B Kaner ◽  
Jean-Pierre Fleurial

AbstractRecently nanostructured bulk silicon and silicon-germanium have achieved large increases in the thermoelectric figure of merit (ZT). The ZT enhancement is attributed to a significant reduction in the lattice thermal conductivity while maintaining relatively high carrier mobility. Silicon-based thermoelectric devices are attractive due to their low-toxicity, thermal stability, low density, relative abundance and low cost of production. Although significant enhancements in ZT have been achieved using the nanostructuring route, additional decoupling of the thermal and electric transport terms is still necessary in order for silicon-based materials to be viable for thermoelectric applications such as waste heat recovery or radioisotope thermoelectric generators. It is theorized that additional increases in ZT could be achieved by forming composites with nanostructured inert inclusions to further scatter the heat-carrying phonons. Here we present the impact of insulating and conductive nanoparticle composites on ZT. The nanostructured composites are formed via ball milling and high pressure sintering of the nanoparticles. The thermoelectric properties and microstructure of the silicon-based composites are discussed.


2010 ◽  
Vol 108 (2) ◽  
pp. 024312 ◽  
Author(s):  
Hock-Chun Chin ◽  
Xiao Gong ◽  
Tien Khee Ng ◽  
Wan Khai Loke ◽  
Choun Pei Wong ◽  
...  

2013 ◽  
Vol 114 (2) ◽  
pp. 1371-1412 ◽  
Author(s):  
Michele Amato ◽  
Maurizia Palummo ◽  
Riccardo Rurali ◽  
Stefano Ossicini

2002 ◽  
Vol 17 (7) ◽  
pp. 1580-1586 ◽  
Author(s):  
Sherif Sedky ◽  
Ann Witvrouw ◽  
Matty Caymax ◽  
Annelies Saerens ◽  
Paul Van Houtte

This paper investigates the possibility of reducing the deposition temperature of polycrystalline silicon germanium to a level compatible with complementary metal-oxide semiconductor (CMOS) post processing. To achieve this goal, the exact wafer temperature during deposition was experimentally determined and it was found to be 30 °C lower than the reactor setting temperature. The deposition temperature was reduced from 625 to 500 °C. The impact of varying the deposition pressure from 10 to 760 torr and the germanium content from 15% to 100% was investigated. X-ray diffraction spectroscopy and transmission electron microscopy showed that the SixGe1−x films deposited at an actual wafer temperature of 520 °C are polycrystalline for germanium contents as low as 15%. Also, it was shown that the deposition conditions can be adjusted to yield a low tensile stress at an actual wafer temperature of 520 °C, which is suitable for integrating surface micromachined micro-electromechanical systems on top of standard CMOS wafers with Al interconnects.


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