scholarly journals Synthesis of a monoclinic BiVO4 nanorod array as the photocatalyst for efficient photoelectrochemical water oxidation

RSC Advances ◽  
2017 ◽  
Vol 7 (13) ◽  
pp. 7547-7554 ◽  
Author(s):  
Bing-Chang Xiao ◽  
Lu-Yin Lin ◽  
Jia-Yo Hong ◽  
Hong-Syun Lin ◽  
Yung-Tao Song
Keyword(s):  
Tin Oxide ◽  
Water Oxidation ◽  
Solution Method ◽  
Nanorod Array ◽  
Simple Solution ◽  
Photoelectrochemical Water Oxidation ◽  
Monoclinic Bivo4

The BiVO4 nanorod array is successfully synthesized on fluorine-doped tin oxide (FTO) glasses via a simple solution method, and the electrode is applied as the photoanode for water oxidation.

scholarly journals Correction: Enhanced photoelectrochemical water oxidation via atomic layer deposition of TiO2on fluorine-doped tin oxide nanoparticle films

Nanoscale ◽  
2015 ◽  
Vol 7 (28) ◽  
pp. 12226-12226 ◽  
Author(s):  
Isvar A. Cordova ◽  
Qing Peng ◽  
Isa L. Ferrall ◽  
Adam J. Rieth ◽  
Paul G. Hoertz ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Tin Oxide ◽  
Water Oxidation ◽  
Atomic Layer ◽  
Nanoparticle Films ◽  
Layer Deposition ◽  
Oxide Nanoparticle ◽  
Photoelectrochemical Water Oxidation

Ultrathin alumina passivation for improved photoelectrochemical water oxidation catalysis of tin oxide sensitized by a phosphonate-functionalized perylene diimide first without, and then with, CoOy

2021 ◽  
Author(s):  
Carly F. Jewell ◽  
Ashwanth Subramanian ◽  
Chang-Yong Nam ◽  
Richard G. Finke
Keyword(s):  
Catalytic Activity ◽  
Tin Oxide ◽  
Water Oxidation ◽  
Oxidation Catalysis ◽  
Perylene Diimide ◽  
Water Oxidation Catalysis ◽  
Photoelectrochemical Water Oxidation

Deposition of an ultrathin AlOx overlayer applied by ALD on the PMPDI/SnO2 photoanode improves the photoactivity and catalytic activity of the system. ALD AlOx also helps support the understanding of the “anti-catalysis” behavior of added CoOy.

Conformal SnOx heterojunction coatings for stabilized photoelectrochemical water oxidation using arrays of silicon microcones

2020 ◽  
Vol 8 (18) ◽  
pp. 9292-9301
Author(s):  
Ivan A. Moreno-Hernandez ◽  
Sisir Yalamanchili ◽  
Harold J. Fu ◽  
Harry A. Atwater ◽  
Bruce S. Brunschwig ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Oxide Layer ◽  
Tin Oxide ◽  
Water Oxidation ◽  
Surface Recombination ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Photoelectrochemical Water Oxidation

A protective tin oxide layer formed by atomic-layer deposition limits surface recombination at n-Si surfaces and produces ∼620 mV of photovoltage on planar n-Si photoanodes. The layer conformally coats structures such as Si microcone arrays.

Sn-doped hematite films as photoanodes for efficient photoelectrochemical water oxidation

2015 ◽  
Vol 3 (13) ◽  
pp. 6751-6755 ◽  
Author(s):  
Dong-Dong Qin ◽  
Yun-Lei Li ◽  
Ting Wang ◽  
Yang Li ◽  
Xiao-Quan Lu ◽  
...  
Keyword(s):  
Tin Oxide ◽  
Water Oxidation ◽  
Electrochemically Deposited ◽  
Oxide Substrate ◽  
Photoelectrochemical Water Oxidation

Sn-doped hematite films were electrochemically deposited on a fluorine-doped tin oxide substrate for use as an anode for efficient photoelectrochemical water oxidation.

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