ION IMPLANTATION DAMAGE OF SILICON AS OBSERVED BY OPTICAL REFLECTION SPECTROSCOPY IN THE 1 TO 6 eV REGION
WP-A2 the use of a scanned continuous laser beam for annealing of ion implantation damage in silicon
1978 ◽
Vol 25
(11)
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pp. 1357-1357
1986 ◽
Vol 4
(4)
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pp. 2174-2176
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Keyword(s):
2016 ◽
Vol 55
(4S)
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pp. 04EG05
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Keyword(s):
1988 ◽
Vol 17
(5)
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pp. 405-409
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