Developing thermally enhanced in situ remediation technology by experiment and numerical simulation

2004 ◽  
Vol 42 (sup1) ◽  
pp. 173-183 ◽  
Author(s):  
Theurer T. Vegas ◽  
Winkler A. Vegas ◽  
Hiester U. Vegas ◽  
Koschitzky H.-P. Vegas
10.2172/43791 ◽  
1994 ◽  
Author(s):  
J.E. Amonette ◽  
J.E. Szecsody ◽  
H.T. Schaef ◽  
Y.A. Gorby ◽  
J.S. Fruchter ◽  
...  

2013 ◽  
Vol 726-731 ◽  
pp. 1751-1754
Author(s):  
Feng Chen ◽  
Ji Hong Xing ◽  
Zhang Wei Cao

Electrokinetic remediation is in-situ remediation technique. Potassium dichromate was chosen as the pollutant and its initial concentration was 500mg·kg-1 in Kaolin soil. This experiment, we are to study the feasibility ,the factors which influence the whole course, including applied voltage, treatment time, soil moisture, OH- produced at the cathode and its control. It indicate that, there is separating out oxygen at anode, hydry at cathode. Cr2O72-and CrO42- absorb electron to change to Cr3+, and unite to Cr (OH)3. The experiment results show OH- produced at the cathode has crucial effects on the removal efficiency of chromium; secondly the applied voltage and treatment time have important influence on the efficiency, and the soil moisture affects the efficiency in some degree.


2013 ◽  
Vol 823 ◽  
pp. 205-213
Author(s):  
Yi Fang Li ◽  
Cheng Gong ◽  
Wen Qiang Wang ◽  
You Fang Li ◽  
Zi Feng Zhou

Continuous and universal in-situ remediation appliance of soil combines taking soil, transmission and restoration of soil, which can achieve the in-situ remediation continuously and avoid the drawback of massive labor power and material resources using domestic soil ex-situ remediation device. The appliance supports many kinds of soil remediation technology, realizing the function of universal technology. And as for the area with serious pollution, various technology combinations can be selected to extend its function. The motion of specific remediation device in the appliance utilizes the single-chip controlling technology, controlling the remediation time interval of different technology. The program selection with various remediation technologies can be finished with buttons. Single-chip controlling system responds quickly, runs stably and precisely controls the remediation device.


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