Measurement of the induced plasma current in a planar coil, low-frequency, RF induction plasma source

1997 ◽  
Vol 6 (2) ◽  
pp. 201-211 ◽  
Author(s):  
I M El-Fayoumi ◽  
I R Jones
Keyword(s):  
Low Frequency ◽  
Plasma Source ◽  
Plasma Current ◽  
Induction Plasma ◽  
Planar Coil ◽  
Rf Induction Plasma

Pattern Writing by Implantation in a Large-Scale PSII System With Planar Inductively Coupled Plasma Source

2000 ◽  
Vol 624 ◽  
Author(s):  
Lingling Wu ◽  
Hongjun Gao ◽  
Dennis M. Manos
Keyword(s):  
Inductively Coupled Plasma ◽  
Large Scale ◽  
Lateral Diffusion ◽  
Plasma Source ◽  
Direct Writing ◽  
Large Area ◽  
Depth Profiles ◽  
Geometric Patterns ◽  
Planar Coil ◽  
Rf Antenna

ABSTRACTA large-scale plasma source immersion ion implantation (PSII) system with planar coil RFI plasma source has been used to study an inkless, deposition-free, mask-based surface conversion patterning as an alternative to direct writing techniques on large-area substrates by implantation. The apparatus has a 0.61 m ID and 0.51 m tall chamber, with a base pressure in the 10−8 Torr range, making it one of the largest PSII presently available. The system uses a 0.43 m ID planar rf antenna to produce dense plasma capable of large-area, uniform materials treatment. Metallic and semiconductor samples have been implanted through masks to produce small geometric patterns of interest for device manufacturing. Si gratings were also implanted to study application to smaller features. Samples are characterized by AES, TEM and variable-angle spectroscopic ellipsometry. Composition depth profiles obtained by AES and VASE are compared. Measured lateral and depth profiles are compared to the mask features to assess lateral diffusion, pattern transfer fidelity, and wall-effects. The paper also presents the results of MAGIC calculations of the flux and angle of ion trajectories through the boundary layer predicting the magnitude of flux as a function of 3-D location on objects in the expanding sheath

Preparation procedure for spherical titanium powders by RF induction plasma

2011 ◽  
Vol 23 (12) ◽  
pp. 3353-3357
Author(s):  
古忠涛 Gu Zhongtao ◽  
叶高英 Ye Gaoying ◽  
金玉萍 Jin Yuping
Keyword(s):  
Preparation Procedure ◽  
Induction Plasma ◽  
Titanium Powders ◽  
Rf Induction Plasma

Mixing effect on a nonequilibrium RF induction plasma

2000 ◽  
Vol 36 (5) ◽  
pp. 433-437 ◽  
Author(s):  
H. Nishiyama ◽  
Takehiko Sato ◽  
S. Ito ◽  
Takeshi Sato ◽  
S. Kamiyama
Keyword(s):  
Mixing Effect ◽  
Induction Plasma ◽  
Rf Induction Plasma

Propellant grade ultrafine aluminum powder by RF induction plasma

2018 ◽  
Vol 29 (3) ◽  
pp. 804-812 ◽  
Author(s):  
P. Sai Karthik ◽  
S.B. Chandrasekhar ◽  
D. Chakravarty ◽  
P.V.V. Srinivas ◽  
V.S.K. Chakravadhanula ◽  
...  
Keyword(s):  
Aluminum Powder ◽  
Induction Plasma ◽  
Ultrafine Aluminum ◽  
Ultrafine Aluminum Powder ◽  
Rf Induction Plasma

scholarly journals Externally Heated Hollow Cathode Arc Plasma Source for Experiments in Plasma Wakefield Acceleration

Instruments ◽  
2019 ◽  
Vol 3 (3) ◽  
pp. 48 ◽  
Author(s):  
Ryan Roussel ◽  
Gerard Andonian ◽  
Claire Hansel ◽  
Gerard Lawler ◽  
Walter Lynn ◽  
...  
Keyword(s):  
Hollow Cathode ◽  
Plasma Source ◽  
Plasma Current ◽  
Arc Plasma ◽  
Time Resolved ◽  
Wakefield Acceleration ◽  
Beam Parameters ◽  
Cathode Arc ◽  
Plasma Wakefield ◽  
Wakefield Accelerator

An externally heated, hollow cathode arc source was recommissioned at UCLA for use in experiments to drive plasma wakefields with shaped beams at the Argonne Wakefield Accelerator. The hollow cathode arc source provides a robust plasma column with a density in the 10 13 – 10 14 cm − 3 range while external heating of the cathode allows the plasma arc regime to be accessed with applied voltages down to 20 V. Overall source operating principals are described, along with time-resolved plasma current measurements and plasma density characterization with the use of a triple Langumir probe. The results show that relevant plasma densities that match facility beam parameters are readily achievable.

scholarly journals Functionalization of a Nonequilibrium RF Induction Plasma by Gas Mixtures.

1998 ◽  
Vol 41 (2) ◽  
pp. 502-510 ◽  
Author(s):  
Hideya NISHIYAMA ◽  
Norihiro FUKAI ◽  
Shinichi KAMIYAMA
Keyword(s):  
Gas Mixtures ◽  
Induction Plasma ◽  
Rf Induction Plasma

Optical ion energy measurements in a radio‐frequency‐induction plasma source

1993 ◽  
Vol 73 (4) ◽  
pp. 1621-1626 ◽  
Author(s):  
James A. O’Neill ◽  
Michael S. Barnes ◽  
John H. Keller
Keyword(s):  
Radio Frequency ◽  
Plasma Source ◽  
Ion Energy ◽  
Induction Plasma
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