scholarly journals Investigation of the gas flow effect on an atmospheric pressure RF plasma torch

2011 ◽  
Vol 275 ◽  
pp. 012012 ◽  
Author(s):  
M Atanasova ◽  
D Mihailova ◽  
E Carbone ◽  
J van Dijk ◽  
J J A M van der Mullen ◽  
...  
Keyword(s):  
Atmospheric Pressure ◽  
Plasma Torch ◽  
Gas Flow ◽  
Rf Plasma ◽  
Flow Effect

Low–power plasma torch method for the production of crystalline spherical ceramic particles

2001 ◽  
Vol 16 (5) ◽  
pp. 1256-1265 ◽  
Author(s):  
Chun-Ku Chen ◽  
Seth Gleiman ◽  
Jonathan Phillips
Keyword(s):  
Particle Size ◽  
Low Power ◽  
Atmospheric Pressure ◽  
Plasma Torch ◽  
Gas Flow ◽  
Microwave Plasma ◽  
Particle Density ◽  
Particle Collision ◽  
Average Particle ◽  
The Impact

A low-power, atmospheric pressure, microwave plasma torch was used to make spherical alumina particles of controlled size from irregularly shaped precursor powders. Detailed studies of the impact of operating parameters, particularly gas identity (argon or air), gas flow rates, and applied power, showed that particle size changed in a predictable fashion. The most important factor in controlling particle size appears to be precursor particle density in the aerosol stream that enters the plasma hot zone. This and other facts suggest that particle collision rate is primarily responsible for determining ultimate particle size, although atomic addition also plays a role. Reproducible volume average particle sizes ranging from 97 to 1150 μm3 were formed from precursor particles of order 14 μm3. Moreover, for the first time we report the creation of an atmospheric pressure low-power air plasma (<1 kW).

Optical diagnostics of a low power—low gas flow rates atmospheric-pressure argon plasma created by a microwave plasma torch

2009 ◽  
Vol 18 (2) ◽  
pp. 025030 ◽  
Author(s):  
Chuji Wang ◽  
Nimisha Srivastava ◽  
Susan Scherrer ◽  
Ping-Rey Jang ◽  
Theodore S. Dibble ◽  
...  
Keyword(s):  
Low Power ◽  
Atmospheric Pressure ◽  
Plasma Torch ◽  
Gas Flow ◽  
Microwave Plasma ◽  
Argon Plasma ◽  
Optical Diagnostics ◽  
Flow Rates ◽  
Microwave Plasma Torch

scholarly journals Atmospheric Pressure Plasma Deposition of TiO2: A Review

Materials ◽  
2020 ◽  
Vol 13 (13) ◽  
pp. 2931
Author(s):  
Soumya Banerjee ◽  
Ek Adhikari ◽  
Pitambar Sapkota ◽  
Amal Sebastian ◽  
Sylwia Ptasinska
Keyword(s):  
Atmospheric Pressure ◽  
Gas Flow ◽  
Plasma Deposition ◽  
Atmospheric Pressure Plasma ◽  
Cost Savings ◽  
Historical Background ◽  
Pressure Plasma ◽  
Wide Range ◽  
The Status ◽  
Deposition Techniques

Atmospheric pressure plasma (APP) deposition techniques are useful today because of their simplicity and their time and cost savings, particularly for growth of oxide films. Among the oxide materials, titanium dioxide (TiO2) has a wide range of applications in electronics, solar cells, and photocatalysis, which has made it an extremely popular research topic for decades. Here, we provide an overview of non-thermal APP deposition techniques for TiO2 thin film, some historical background, and some very recent findings and developments. First, we define non-thermal plasma, and then we describe the advantages of APP deposition. In addition, we explain the importance of TiO2 and then describe briefly the three deposition techniques used to date. We also compare the structural, electronic, and optical properties of TiO2 films deposited by different APP methods. Lastly, we examine the status of current research related to the effects of such deposition parameters as plasma power, feed gas, bias voltage, gas flow rate, and substrate temperature on the deposition rate, crystal phase, and other film properties. The examples given cover the most common APP deposition techniques for TiO2 growth to understand their advantages for specific applications. In addition, we discuss the important challenges that APP deposition is facing in this rapidly growing field.

scholarly journals Control of electron dynamics, radical and metastable species generation in atmospheric pressure RF plasma jets by Voltage Waveform Tailoring

2019 ◽  
Vol 28 (9) ◽  
pp. 094001 ◽  
Author(s):  
I Korolov ◽  
Z Donkó ◽  
G Hübner ◽  
L Bischoff ◽  
P Hartmann ◽  
...  
Keyword(s):  
Atmospheric Pressure ◽  
Plasma Jets ◽  
Rf Plasma ◽  
Electron Dynamics ◽  
Voltage Waveform

scholarly journals Influence of gas flow on argon microwave plasma jet at atmospheric pressure

2011 ◽  
Vol 206 (6) ◽  
pp. 1449-1453 ◽  
Author(s):  
Shouichiro Iio ◽  
Kosuke Yanagisawa ◽  
Chizuru Uchiyama ◽  
Katsuya Teshima ◽  
Naomichi Ezumi ◽  
...  
Keyword(s):  
Atmospheric Pressure ◽  
Gas Flow ◽  
Microwave Plasma ◽  
Plasma Jet

Microwave Torch Plasmas for Decomposition of Gaseous Pollutants

2004 ◽  
Vol 7 (1) ◽  
Author(s):  
Mariusz Jasiński ◽  
Jerzy Mizeraczyk ◽  
Zenon Zakrzewski
Keyword(s):  
Atmospheric Pressure ◽  
Energy Cost ◽  
Gas Flow ◽  
Coaxial Line ◽  
Low Energy ◽  
Gaseous Pollutants ◽  
Gas Flow Rate ◽  
Torch Discharge ◽  
Volatile Organic ◽  
Moderate Power

AbstractResults of the study of decomposition of volatile organic compounds (VOCs including Freons) in their mixtures with either synthetic air or nitrogen, and nitrogen oxides NOx in their mixtures with N2 or Ar in low (~ 100 W) and moderate-power (200-400 W) microwave torch plasmas at atmospheric pressure are presented. Three types of microwave torch discharge (MTD) generators, i.e. the low-power coaxial-line-based MID, the moderate-power waveguide-based coaxial-line MTD and the moderate-power waveguide-based MTD generators were used. The gas flow rate and microwave power (2.45 GHz) delivered to the discharge were in the range of 1÷3 l/min and 100÷ 400 W, respectively. Concentrations of the processed gaseous pollutants usually were from several up to several tens percent. The energy efficiency of decomposition of several gaseous pollutants reached 1000 g/kWh. It was found that the microwave torch plasmas fully decomposed the pollutants at relatively low energy cost. This suggests that the MTD plasma can be a useful tool for decomposition of highly-concentrated gaseous pollutants.

Effect of gas flow on transport of O (3Pj) atoms produced in ac power excited non-equilibrium atmospheric-pressure O2/Ar plasma jet

2013 ◽  
Vol 46 (46) ◽  
pp. 464006 ◽  
Author(s):  
Keigo Takeda ◽  
Masanori Kato ◽  
Fengdong Jia ◽  
Kenji Ishikawa ◽  
Hiroyuki Kano ◽  
...  
Keyword(s):  
Atmospheric Pressure ◽  
Gas Flow ◽  
Plasma Jet ◽  
Ac Power ◽  
Ar Plasma ◽  
Non Equilibrium
Sign in / Sign up

Export Citation Format

Share Document