Low-resistivity poly-metal gate electrode durable for high-temperature processing

To gain a better understanding of the surface faceting that occurs in α-alumina during high temperature processing, atomic force microscopy (AFM) studies have been performed to follow the formation and evolution of the facets. AFM was chosen because it allows for analysis of topographical details down to the atomic level with minimal sample preparation. This is in contrast to SEM analysis, which typically requires the application of conductive coatings that can alter the surface between subsequent heat treatments. Similar experiments have been performed in the TEM; however, due to thin foil and hole edge effects the results may not be representative of the behavior of bulk surfaces.The AFM studies were performed on a Digital Instruments Nanoscope III using microfabricated Si3N4 cantilevers. All images were recorded in air with a nominal applied force of 10-15 nN. The alumina samples were prepared from pre-polished single crystals with (0001), , and nominal surface orientations.

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Applications of CoSi2 to VLSI and ULSI

MRS Proceedings ◽

10.1557/proc-320-3 ◽

1993 ◽

Vol 320 ◽

Cited By ~ 7

Author(s):

S. P. Murarka

Keyword(s):

Corrosion Resistance ◽

High Temperature ◽

Integrated Circuits ◽

Lattice Mismatch ◽

Electrical Contacts ◽

High Conductivity ◽

Low Resistivity ◽

Polysilicon Films ◽

Continued Use

ABSTRACTSilicides have found application as high conductivity, high temperature, and corrosion resistance materials that form good electrical contacts to silicon and good low resistivity cladding on polysilicon films used as gate metal. Of various silicides investigated in past CoSi2 offers several advantages including lowest resistivity, self-aligned formation, low lattice mismatch with silicon, stability in presence of dopants and on SiO2, Si3N4, or Sioxynitrides, and reliability to process temperatures ≤900°C even when used in thicknesses as thin as 50-60 nm. Thus, CoSi2 has found an application in VLSI and ULSI. In this paper, the properties, formation and processing, reliability, and applicability of CoSi2 will be reviewed. It will be shown that CoSi2 is only silicide that offers properties and reliability for continued use in sub-0.25 pm VLSI and ULSI integrated circuits.

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Influence of Enzyme Activity of Bacteria and Leucocytes in Raw Milk on Age Gelation after UHT Processing

Journal of Food Protection ◽

10.4315/0362-028x-47.2.105 ◽

1984 ◽

Vol 47 (2) ◽

pp. 105-107 ◽

Cited By ~ 13

Author(s):

BARBARA P. KEOGH ◽

G. PETTINGILL

Keyword(s):

Enzyme Activity ◽

High Temperature ◽

Inhibitory Action ◽

Raw Milk ◽

Bacterial Counts ◽

High Temperature Processing ◽

The Relationship ◽

Ultra High Temperature

An investigation was undertaken into the relationship between the enzyme activity of cells harvested from raw milk and time taken for age gelation (TAG) to occur in the milk after ultra-high-temperature processing. It was shown that there was no relationship between the TAG and the bacterial counts on milk agar at 30°C or 7°C nor was there a relationship between the counts and the level of enzyme activity of the harvested cells. There was, however, a significant correlation between the level of enzyme activity of the harvested cells and the TAG. When extra bovine leucocytes were added to raw milk before processing, the TAG was increased. This suggested that there was an inhibitory action of leucocytes in development of age gelation.

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