Influence of the Arched Magnetic Field on the Cathode Erosion Rate of the Vacuum Arc Discharge

Author(s):  
Dmitry Dukhopelnikov ◽  
Daniil Kirillov
Author(s):  
I V Karpov ◽  
A V Ushakov ◽  
A A Lepeshev ◽  
L Yu Fedorov ◽  
E A Dorozhkina ◽  
...  

2014 ◽  
Vol 880 ◽  
pp. 288-291
Author(s):  
Igor Stepanov ◽  
Alexander Ryabchikov ◽  
Denis Sivin

The paper describes high broad metal ion source based on dc macroparticle filtered vacuum arc plasma generation with the dc ion-beam extraction. The possibility of formation of pseudo ribbon beam of metal ions with the parameters: ion beam length 0.6 m, ion current up to 0.2 A, accelerating voltage 40 kV, and ion energy up to 160 kV has been demonstrated. The pseudo ribbon ion beam is formed from dc driven vacuum arc plasma. The results of investigation of the vacuum arc evaporator ion-emission properties are presented. The influence of magnetic field strength near the cathode surface on the arc spot movement and ion-emission properties of vacuum-arc discharge for different cathode materials are determined. It was shown that vacuum-arc discharge stability can be reached when the magnetic field strength ranges from 40 to 70 Gs on the cathode surface.


2011 ◽  
Vol 337 ◽  
pp. 70-76
Author(s):  
Wen Chang Lang

In this design, the concept of static magnetic field was given up and the idea of controlling the arc discharge by transverse rotating magnetic field (TRMF) was put forward. Based on the principle of RMF generation, the specific scheme and the cohesiveness integral structure design of the TRMF steered arc source were constructed. In the specific design, a bipolar symmetric RMF (N-S) parallel to the cathode surface and homogenously covered the whole cathode was generated by stationary three-phase windings carrying three-phase alternating currents without any visible physical rotation. Through changing the frequency and the amplitude of the exciting current (these two parameters can be adjusted independently), the speed of rotation and the magnetic intensity could be regulated continuously. Experiments about TRMF steered arc source used in vacuum arc deposition (VAD) showed that: the arc voltage increased with not only an increase in the intensity of magnetic field connected with the supplied current but also an increase in the frequency of magnetic field. TRMF could reduce MPs content to a great extent and get a smooth film surface. A high utilization of the target was achieved due to the homogenous arc discharge covered the entire cathode surface. We believe this design is a new-type arc source and it will bring inspiration and great interest in the VAD domain.


Sign in / Sign up

Export Citation Format

Share Document