Influence of Magnetic Field on Vacuum Arc Discharge Volt-Ampere Characteristics

The paper describes high broad metal ion source based on dc macroparticle filtered vacuum arc plasma generation with the dc ion-beam extraction. The possibility of formation of pseudo ribbon beam of metal ions with the parameters: ion beam length 0.6 m, ion current up to 0.2 A, accelerating voltage 40 kV, and ion energy up to 160 kV has been demonstrated. The pseudo ribbon ion beam is formed from dc driven vacuum arc plasma. The results of investigation of the vacuum arc evaporator ion-emission properties are presented. The influence of magnetic field strength near the cathode surface on the arc spot movement and ion-emission properties of vacuum-arc discharge for different cathode materials are determined. It was shown that vacuum-arc discharge stability can be reached when the magnetic field strength ranges from 40 to 70 Gs on the cathode surface.

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Charge-state distribution of ions in a vacuum arc discharge plasma in a high magnetic field

Technical Physics ◽

10.1134/1.1259030 ◽

1998 ◽

Vol 43 (5) ◽

pp. 514-517 ◽

Cited By ~ 20

Author(s):

A. G. Nikolaev ◽

E. M. Oks ◽

G. Yu. Yushkov

Keyword(s):

Magnetic Field ◽

Charge State ◽

High Magnetic Field ◽

Discharge Plasma ◽

Arc Discharge ◽

Charge State Distribution ◽

Vacuum Arc ◽

State Distribution

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Design and Performance of the Transverse Rotating Magnetic Field Steered Arc Source Used in Vacuum Arc Deposition

Advanced Materials Research ◽

10.4028/www.scientific.net/amr.337.70 ◽

2011 ◽

Vol 337 ◽

pp. 70-76

Author(s):

Wen Chang Lang

Keyword(s):

Magnetic Field ◽

Cathode Surface ◽

Arc Discharge ◽

Film Surface ◽

Structure Design ◽

Rotating Magnetic Field ◽

Vacuum Arc ◽

Three Phase ◽

Vacuum Arc Deposition ◽

Arc Deposition

In this design, the concept of static magnetic field was given up and the idea of controlling the arc discharge by transverse rotating magnetic field (TRMF) was put forward. Based on the principle of RMF generation, the specific scheme and the cohesiveness integral structure design of the TRMF steered arc source were constructed. In the specific design, a bipolar symmetric RMF (N-S) parallel to the cathode surface and homogenously covered the whole cathode was generated by stationary three-phase windings carrying three-phase alternating currents without any visible physical rotation. Through changing the frequency and the amplitude of the exciting current (these two parameters can be adjusted independently), the speed of rotation and the magnetic intensity could be regulated continuously. Experiments about TRMF steered arc source used in vacuum arc deposition (VAD) showed that: the arc voltage increased with not only an increase in the intensity of magnetic field connected with the supplied current but also an increase in the frequency of magnetic field. TRMF could reduce MPs content to a great extent and get a smooth film surface. A high utilization of the target was achieved due to the homogenous arc discharge covered the entire cathode surface. We believe this design is a new-type arc source and it will bring inspiration and great interest in the VAD domain.

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A theoretical study of the impact of magnetic field of Hall current on the parameters of a high-current vacuum-arc discharge

High Temperature ◽

10.1134/s10740-008-2003-0 ◽

2008 ◽

Vol 46 (2) ◽

pp. 162-172 ◽

Cited By ~ 1

Author(s):

Ya. I. Londer ◽

K. N. Ul’yanov

Keyword(s):

Magnetic Field ◽

Theoretical Study ◽

Hall Current ◽

Arc Discharge ◽

Vacuum Arc ◽

High Current ◽

The Impact

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Preparation and characterization of thin films of carbon nitride

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100136891 ◽

1995 ◽

Vol 53 ◽

pp. 104-105

Author(s):

L. Wan ◽

R. F. Egerton

Keyword(s):

Carbon Nitride ◽

Arc Discharge ◽

Ion Beam ◽

Chemical Vapor ◽

Reactive Sputtering ◽

Vacuum Arc ◽

Specimen Preparation ◽

Bonding Structure ◽

Electron Energy Loss

INTRODUCTION Recently, a new compound carbon nitride (CNx) has captured the attention of materials scientists, resulting from the prediction of a metastable crystal structure β-C3N4. Calculations showed that the mechanical properties of β-C3N4 are close to those of diamond. Various methods, including high pressure synthesis, ion beam deposition, chemical vapor deposition, plasma enhanced evaporation, and reactive sputtering, have been used in an attempt to make this compound. In this paper, we present the results of electron energy loss spectroscopy (EELS) analysis of composition and bonding structure of CNX films deposited by two different methods.SPECIMEN PREPARATION Specimens were prepared by arc-discharge evaporation and reactive sputtering. The apparatus for evaporation is similar to the traditional setup of vacuum arc-discharge evaporation, but working in a 0.05 torr ambient of nitrogen or ammonia. A bias was applied between the carbon source and the substrate in order to generate more ions and electrons and change their energy. During deposition, this bias causes a secondary discharge between the source and the substrate.

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