Properties of TiN films deposited by atomic layer deposition for through silicon via applications
Keyword(s):
2003 ◽
Vol 42
(Part 2, No. 4B)
◽
pp. L414-L416
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Keyword(s):
2015 ◽
Vol 55
(1)
◽
pp. 016502
◽
2014 ◽
Vol 19
(2)
◽
pp. 144-149
◽
2003 ◽
Vol 42
(Part 1, No. 7A)
◽
pp. 4245-4248
◽
Keyword(s):
2018 ◽
Vol 36
(5)
◽
pp. 051505
◽
Keyword(s):
2018 ◽
Vol 36
(4)
◽
pp. 041501
◽
Keyword(s):
2012 ◽
Vol 1
(6)
◽
pp. P285-P290
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