scholarly journals Properties and morphology of TiN films deposited by atomic layer deposition

2014 ◽  
Vol 19 (2) ◽  
pp. 144-149 ◽  
Author(s):  
Siyi Xie ◽  
Jian Cai ◽  
Qian Wang ◽  
Lu Wang ◽  
Ziyu Liu
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Tin Films ◽  
Layer Deposition

Obtaining low resistivity (∼100 μΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor

2018 ◽  
Vol 36 (5) ◽  
pp. 051505 ◽  
Author(s):  
Igor Krylov ◽  
Ekaterina Zoubenko ◽  
Kamira Weinfeld ◽  
Yaron Kauffmann ◽  
Xianbin Xu ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Tin Films ◽  
Low Resistivity ◽  
Layer Deposition

In situspectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition

2006 ◽  
Vol 100 (2) ◽  
pp. 023534 ◽  
Author(s):  
E. Langereis ◽  
S. B. S. Heil ◽  
M. C. M. van de Sanden ◽  
W. M. M. Kessels
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Tin Films ◽  
Layer Deposition

Growth of Sub-Nanometer Thin Continuous TiN Films by Atomic Layer Deposition

2012 ◽  
Vol 1 (6) ◽  
pp. P285-P290 ◽  
Author(s):  
H. Van Bui ◽  
A. Y. Kovalgin ◽  
R. A. M. Wolters
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Tin Films ◽  
Layer Deposition

Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization

2004 ◽  
Vol 24 (1-2) ◽  
pp. 289-291 ◽  
Author(s):  
Do-Heyoung Kim ◽  
Young Jae Kim ◽  
Jun-Hyung Park ◽  
Jin Hyeok Kim
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Copper Metallization ◽  
Tin Films ◽  
Layer Deposition
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