Processing of the random observations with Flatten — Gaussian distribution by approximate order statistics method

2015 IEEE 8th International Conference on Intelligent Data Acquisition and Advanced Computing Systems: Technology and Applications (IDAACS) ◽

10.1109/idaacs.2015.7340717 ◽

2015 ◽

Cited By ~ 1

Author(s):

Mykhaylo Dorozhovets ◽

Ivanna Popovych

Keyword(s):

Order Statistics ◽

Gaussian Distribution ◽

Approximate Order

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The Inverse Gaussian Distribution in Wireless Channels: Second-Order Statistics and Channel Capacity

IEEE Transactions on Communications ◽

10.1109/tcomm.2012.081512.100253 ◽

2012 ◽

Vol 60 (11) ◽

pp. 3167-3173 ◽

Cited By ~ 19

Author(s):

Imene Trigui ◽

Amine Laourine ◽

Sofiene Affes ◽

Alex Stephenne

Keyword(s):

Order Statistics ◽

Channel Capacity ◽

Gaussian Distribution ◽

Wireless Channels ◽

Inverse Gaussian Distribution ◽

Second Order ◽

Inverse Gaussian ◽

Second Order Statistics

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A New Technique of Intelligent Constructing Unbiased Prediction Limits on Future Order Statistics Coming from an Inverse Gaussian Distribution under Parametric Uncertainty

Automatic Control and Computer Sciences ◽

10.3103/s0146411619030088 ◽

2019 ◽

Vol 53 (3) ◽

pp. 223-235 ◽

Cited By ~ 3

Author(s):

N. A. Nechval ◽

G. Berzins ◽

K. N. Nechval ◽

J. Krasts

Keyword(s):

Order Statistics ◽

Gaussian Distribution ◽

Parametric Uncertainty ◽

Inverse Gaussian Distribution ◽

New Technique ◽

Inverse Gaussian ◽

Prediction Limits ◽

A New Technique ◽

Unbiased Prediction

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PROCESSING OF THE OBSERVATIONS RESULTS WITH THE FLATTEN-GAUSSIAN DISTRIBUTION BY THE ORDER STATISTICS METHOD

Scientific Journals of Rzeszów University of Technology Series Electrotechnics ◽

10.7862/re.2015.31 ◽

2015 ◽

pp. 71-80 ◽

Cited By ~ 1

Author(s):

Ivanna Bubela ◽

Keyword(s):

Order Statistics ◽

Gaussian Distribution

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Structure images of Si, Ge and Mos2 crystals and some application to radiation damage studies

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s042482010010860x ◽

1978 ◽

Vol 36 (1) ◽

pp. 292-293 ◽

Cited By ~ 1

Author(s):

K. Izui ◽

T. Nishida ◽

S. Furuno ◽

H. Otsu ◽

S. Kuwabara

Keyword(s):

Radiation Damage ◽

Exposure Time ◽

Gaussian Distribution ◽

Intensity Distribution ◽

Chromatic Aberration ◽

Magnetic Lens

Recently we have observed the structure images of silicon in the (110), (111) and (100) projection respectively, and then examined the optimum defocus and thickness ranges for the formation of such images on the basis of calculations of image contrasts using the n-slice theory. The present paper reports the effects of a chromatic aberration and a slight misorientation on the images, and also presents some applications of structure images of Si, Ge and MoS2 to the radiation damage studies.(1) Effect of a chromatic aberration and slight misorientation: There is an inevitable fluctuation in the amount of defocus due to a chromatic aberration originating from the fluctuations both in the energies of electrons and in the magnetic lens current. The actual image is a results of superposition of those fluctuated images during the exposure time. Assuming the Gaussian distribution for defocus, Δf around the optimum defocus value Δf0, the intensity distribution, I(x,y) in the image formed by this fluctuation is given by

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