Monitoring method for deposited film causing particles in mass-production plasma etching process using a load impedance monitoring system

2016 ◽  
Author(s):  
Yuji Kasashima ◽  
Fumihiko Uesugi
Keyword(s):  
Monitoring System ◽  
Plasma Etching ◽  
Mass Production ◽  
Etching Process ◽  
Load Impedance ◽  
Monitoring Method ◽  
Plasma Etching Process ◽  
Impedance Monitoring ◽  
Deposited Film

Silicon Micro-Channel Definition via ICP-RIE Plasma Etching Process Using Different Aluminum Hardmasks

2021 ◽  
pp. 1-7
Author(s):  
Hugo S. Alvarez ◽  
Frederico H. Cioldin ◽  
Audrey R. Silva ◽  
Luana C. J. Espinola ◽  
Alfredo R. Vaz ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Etching Process ◽  
Micro Channel ◽  
Plasma Etching Process

Characterization of the CH4/H2/Ar high density plasma etching process for HgCdTe

1999 ◽  
Vol 28 (4) ◽  
pp. 347-354 ◽  
Author(s):  
C. R. Eddy ◽  
D. Leonhardt ◽  
V. A. Shamamian ◽  
J. R. Meyer ◽  
C. A. Hoffman ◽  
...  
Keyword(s):  
Plasma Etching ◽  
High Density ◽  
Etching Process ◽  
Plasma Etching Process ◽  
Density Plasma

Investigation of a Plasma-Etching Process That Uses a Porous Dielectric Template

2008 ◽  
Vol 53 (9(4)) ◽  
pp. 2270-2274
Author(s):  
Luqi Yuan ◽  
Xiaoxia Zhong ◽  
Xiaochen Wu ◽  
Qiwei Shu ◽  
Yuxing Xia
Keyword(s):  
Plasma Etching ◽  
Etching Process ◽  
Plasma Etching Process
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