Silicon Wafer Surface-Temperature Monitoring System for Plasma Etching Process

2011 ◽  
Vol 32 (7-8) ◽  
pp. 1457-1466 ◽  
Author(s):  
Y. Yamada ◽  
J. Ishii ◽  
A. Nakaoka ◽  
Y. Mizojiri
Keyword(s):  
Surface Temperature ◽  
Monitoring System ◽  
Silicon Wafer ◽  
Plasma Etching ◽  
Temperature Monitoring ◽  
Etching Process ◽  
Wafer Surface ◽  
Plasma Etching Process ◽  
Silicon Wafer Surface

Silicon Micro-Channel Definition via ICP-RIE Plasma Etching Process Using Different Aluminum Hardmasks

2021 ◽  
pp. 1-7
Author(s):  
Hugo S. Alvarez ◽  
Frederico H. Cioldin ◽  
Audrey R. Silva ◽  
Luana C. J. Espinola ◽  
Alfredo R. Vaz ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Etching Process ◽  
Micro Channel ◽  
Plasma Etching Process

Characterization of the CH4/H2/Ar high density plasma etching process for HgCdTe

1999 ◽  
Vol 28 (4) ◽  
pp. 347-354 ◽  
Author(s):  
C. R. Eddy ◽  
D. Leonhardt ◽  
V. A. Shamamian ◽  
J. R. Meyer ◽  
C. A. Hoffman ◽  
...  
Keyword(s):  
Plasma Etching ◽  
High Density ◽  
Etching Process ◽  
Plasma Etching Process ◽  
Density Plasma

Investigation of a Plasma-Etching Process That Uses a Porous Dielectric Template

2008 ◽  
Vol 53 (9(4)) ◽  
pp. 2270-2274
Author(s):  
Luqi Yuan ◽  
Xiaoxia Zhong ◽  
Xiaochen Wu ◽  
Qiwei Shu ◽  
Yuxing Xia
Keyword(s):  
Plasma Etching ◽  
Etching Process ◽  
Plasma Etching Process
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