7.5: Massive parallel Electron Beam lithography based on a planar type Si nanowire array ballistic electron source with large surface
Keyword(s):
2013 ◽
Vol 110
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pp. 141-146
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Keyword(s):
Keyword(s):
2010 ◽
Vol 160-162
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pp. 1331-1335
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Keyword(s):
2019 ◽
Vol 494
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pp. 583-590
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2018 ◽
Vol 17
(1)
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pp. 154-160
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