Dual-Gate Characteristics of Amorphous $ \hbox{InGaZnO}_{4}$ Thin-Film Transistors as Compared to Those of Hydrogenated Amorphous Silicon Thin-Film Transistors
2009 ◽
Vol 56
(9)
◽
pp. 2027-2033
◽
2019 ◽
Vol 66
(6)
◽
pp. 2614-2619
◽
2002 ◽
Vol 20
(3)
◽
pp. 1038-1042
◽
1988 ◽
Vol 58
(4)
◽
pp. 389-410
◽
2007 ◽
Vol 46
(3B)
◽
pp. 1318-1321
◽
1995 ◽
Vol 30
(9)
◽
pp. 2254-2256
◽