Preparation of Nanocrystalline Silicon Carbide Thin Films by Hot-Wire Chemical Vapor Deposition at Various Filament Temperature

2006 IEEE 4th World Conference on Photovoltaic Energy Conference ◽

10.1109/wcpec.2006.279805 ◽

2006 ◽

Cited By ~ 1

Author(s):

Akimori Tabata ◽

Yusuke Komura ◽

Masaki Kanaya ◽

Tomoki Narita ◽

Akihiro Kondo ◽

...

Keyword(s):

Thin Films ◽

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Hot Wire ◽

Filament Temperature ◽

Nanocrystalline Silicon Carbide

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Characterization of Undoped, N- and P-Type Hydrogenated Nanocrystalline Silicon Carbide Films Deposited by Hot-Wire Chemical Vapor Deposition at Low Temperatures

Japanese Journal of Applied Physics ◽

10.1143/jjap.46.1415 ◽

2007 ◽

Vol 46 (4A) ◽

pp. 1415-1426 ◽

Cited By ~ 46

Author(s):

Shinsuke Miyajima ◽

Akira Yamada ◽

Makoto Konagai

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Low Temperatures ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Hot Wire ◽

Nanocrystalline Silicon Carbide ◽

P Type

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Nanocrystalline silicon carbide thin films by fluidised/packed bed chemical vapor deposition using a halogen-free single source

Journal of Materials Chemistry ◽

10.1039/c2jm15561c ◽

2012 ◽

Vol 22 (15) ◽

pp. 7551 ◽

Cited By ~ 5

Author(s):

Jayaprakasam Selvakumar ◽

Dakshinamoorthy Sathiyamoorthy

Keyword(s):

Thin Films ◽

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Packed Bed ◽

Nanocrystalline Silicon ◽

Single Source ◽

Nanocrystalline Silicon Carbide ◽

Halogen Free

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Pressure dependent structural and optical properties of silicon carbide thin films deposited by hot wire chemical vapor deposition from pure silane and methane gases

Journal of Materials Science Materials in Electronics ◽

10.1007/s10854-012-0934-z ◽

2012 ◽

Vol 24 (4) ◽

pp. 1361-1368 ◽

Cited By ~ 16

Author(s):

Fatemeh Shariatmadar Tehrani ◽

Boon Tong Goh ◽

Muhamad Rasat Muhamad ◽

Saadah Abdul Rahman

Keyword(s):

Thin Films ◽

Silicon Carbide ◽

Optical Properties ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Hot Wire ◽

Structural And Optical Properties

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Piezoresistive properties of nanocrystalline silicon thin films deposited on plastic substrates by hot-wire chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2006.11.138 ◽

2007 ◽

Vol 515 (19) ◽

pp. 7658-7661 ◽

Cited By ~ 12

Author(s):

P. Alpuim ◽

M. Andrade ◽

V. Sencadas ◽

M. Ribeiro ◽

S.A. Filonovich ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Hot Wire ◽

Plastic Substrates ◽

Silicon Thin Films

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Gas doping ratio effects on p-type hydrogenated nanocrystalline silicon thin films grown by hot-wire chemical vapor deposition

Applied Surface Science ◽

10.1016/j.apsusc.2008.08.038 ◽

2008 ◽

Vol 255 (5) ◽

pp. 2910-2915 ◽

Cited By ~ 12

Author(s):

P.Q. Luo ◽

Z.B. Zhou ◽

K.Y. Chan ◽

D.Y. Tang ◽

R.Q. Cui ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Hot Wire ◽

Silicon Thin Films ◽

P Type ◽

Doping Ratio

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Properties of Nanocrystalline Cubic Silicon Carbide Thin Films Prepared by Hot-Wire Chemical Vapor Deposition Using SiH4/CH4/H2at Various Substrate Temperatures

Japanese Journal of Applied Physics ◽

10.1143/jjap.47.561 ◽

2008 ◽

Vol 47 (1) ◽

pp. 561-565 ◽

Cited By ~ 11

Author(s):

Akimori Tabata ◽

Yusuke Komura ◽

Yoshiki Hoshide ◽

Tomoki Narita ◽

Akihiro Kondo

Keyword(s):

Thin Films ◽

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Hot Wire ◽

Cubic Silicon Carbide ◽

Substrate Temperatures

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Role of argon in hot wire chemical vapor deposition of hydrogenated nanocrystalline silicon thin films

Thin Solid Films ◽

10.1016/j.tsf.2011.01.105 ◽

2011 ◽

Vol 519 (11) ◽

pp. 3501-3508 ◽

Cited By ~ 6

Author(s):

N.A. Bakr ◽

A.M. Funde ◽

V.S. Waman ◽

M.M. Kamble ◽

R.R. Hawaldar ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Hot Wire ◽

Silicon Thin Films

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Effects of deposition pressure on the microstructural and optoelectrical properties of B-doped hydrogenated nanocrystalline silicon (nc-Si:H) thin films grown by hot-wire chemical vapor deposition

Microelectronics Journal ◽

10.1016/j.mejo.2007.10.019 ◽

2008 ◽

Vol 39 (1) ◽

pp. 12-19 ◽

Cited By ~ 10

Author(s):

Peiqing Luo ◽

Zhibin Zhou ◽

Youjie Li ◽

Shuquan Lin ◽

Xiaoming Dou ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Hot Wire ◽

Deposition Pressure

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Preparation of Wide-Gap Hydrogenated Amorphous Silicon Carbide Thin Films by Hot-Wire Chemical Vapor Deposition at a Low Tungsten Temperature

Japanese Journal of Applied Physics ◽

10.1143/jjap.42.l10 ◽

2003 ◽

Vol 42 (Part 2, No.1A/B) ◽

pp. L10-L12 ◽

Cited By ~ 11

Author(s):

Akimori Tabata ◽

Takayuki Nakajima ◽

Teruyoshi Mizutani ◽

Yasuo Suzuoki

Keyword(s):

Thin Films ◽

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Hot Wire ◽

Wide Gap ◽

Hydrogenated Amorphous

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Helicon wave plasma chemical vapor deposition of nanocrystalline silicon carbide films at low substrate temperature

10.1117/12.575650 ◽

2005 ◽

Author(s):

Wei Yu ◽

Wanbing Lu ◽

Baozhu Wang ◽

Li Han ◽

Guangsheng Fu

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Substrate Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Helicon Wave ◽

Nanocrystalline Silicon Carbide

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