Mask Image Planning for Deformation Control in Projection-Based Stereolithography Process

2012 ◽  
Author(s):  
Kai Xu ◽  
Yong Chen
Keyword(s):  
Epoxy Resins ◽  
Lower Cost ◽  
Shape Deformation ◽  
Future Research ◽  
Test Results ◽  
Digital Micromirror Device ◽  
Research Directions ◽  
Deformation Control ◽  
Size Accuracy ◽  
Future Research Directions

In this research, we investigate the shrinkage related deformation control for a mask-image-projection-based Stereolithography process (MIP-SL). Based on a Digital Micromirror Device (DMD), MIP-SL uses an area-processing approach by dynamically projecting mask images onto a resin surface to selectively cure liquid resin into layers of an object. Consequently, the related additive manufacturing process can be much faster with a lower cost than the laser-based Stereolithography Apparatus (SLA) process. However, current commercially available MIP-SL systems are based on Acrylate resins, which have bigger shrinkages than epoxy resins that are widely used in the SLA process. Consequently controlling size accuracy and shape deformation in the MIP-SL process is challenging. To address the problem, we evaluate different image exposing strategies for projection mask images. A mask image planning method and related algorithms have been developed for the MIP-SL process. The planned mask images have been tested by using a commercial MIP-SL machine. The experimental results illustrate that our method can effectively reduce the deformation by as much as 32%. A discussion on the test results and future research directions are also presented.

Influential Factors of Suspension Insulator AC Pollution Flashover Voltage: A Survey

2014 ◽  
Vol 960-961 ◽  
pp. 726-729
Author(s):  
Qing Shen
Keyword(s):  
Influential Factors ◽  
Future Research ◽  
Test Results ◽  
Research Directions ◽  
Current Test ◽  
Suspension Insulator ◽  
Pollution Flashover ◽  
Flashover Voltage ◽  
Future Research Directions ◽  
Insulator Flashover

To make up insufficient of ESDD in insulator flashover voltage analysis, and A more comprehensive assessment of antifouling properties of insulators. This paper discusses the factors of suspension insulator flashover voltage of the AC, analyzed the influence of these factors on the flashover voltage, found the reason for large differences of the current test results of research institutions at home and abroad, and proposed future research directions.

Mask Image Planning for Deformation Control in Projection-Based Stereolithography Process

2015 ◽  
Vol 137 (3) ◽  
Author(s):  
Kai Xu ◽  
Yong Chen
Keyword(s):  
Computer Aided Design ◽  
Low Cost ◽  
Planning Method ◽  
Future Research ◽  
Research Directions ◽  
Deformation Control ◽  
Advantages And Disadvantages ◽  
3D Printers ◽  
Future Research Directions ◽  
Aided Design

The mask-image-projection-based stereolithography process (MIP-SL) using a digital micromirror device (DMD) is an area-processing-based additive manufacturing (AM) process. In the MIP-SL process, a set of mask images are dynamically projected onto a resin surface to selectively cure liquid resin into layers of an object. Consequently, the MIP-SL process can be faster with a lower cost than the laser-based stereolithography apparatus (SLA) process. Currently an increasing number of companies are developing low-cost 3D printers based on the MIP-SL process. However, current commercially available MIP-SL systems are mostly based on Acrylate resins, which have larger shrinkages when compared to epoxy resins used in the laser-based SLA process. Consequently, controlling the shrinkage-related shape deformation in the MIP-SL process is challenging. In this research, we evaluate different mask image exposing strategies for building part layers and their effects on the deformation control in the MIP-SL process. Accordingly, a mask image planning method and related algorithms have been developed for a given computer-aided design (CAD) model. The planned mask images have been tested by using a commercial MIP-SL machine. The experimental results illustrate that our method can effectively reduce the deformation by as much as 32%. A discussion on the advantages and disadvantages of the mask image planning method and future research directions are also presented.

Sign in / Sign up

Export Citation Format

Share Document