Vapor Deposition of Composite Organic-Inorganic Films

Author(s):  
B. Kobrin ◽  
J. Chin ◽  
W. R. Ashurst

Results on the thermal and immersion stability of ultra-thin composite films created by a deposition method call MVD™ (Molecular Vapor Deposition [1]) are reported. It is observed that these composite films were denser and more stable in thermal and immersion applications when compared to traditional self-assembled monolayer (SAM) films. These improved films were created by a special “sequential” or “layered” deposition process sequence. The MVD™ composite coatings can be deposited at room temperature on a variety of materials such as polymers, fibers, metals, alloys and other materials which normally do not allow films to form with complete surface coverage.

2009 ◽  
Vol 618-619 ◽  
pp. 319-323 ◽  
Author(s):  
Parama Chakraborty Banerjee ◽  
Tao Sun ◽  
Jonathan H.W. Wong ◽  
Min Wang

To improve the biocompatibility and bioactivity of NiTi shape memory alloy (SMA), apatite/collagen composite coatings were fabricated on the surface of NiTi SMA at room temperature using the electrochemical deposition technique. Spherical apatite particles and fibrous collagen that formed the composite coating were visible under scanning electron microscope (SEM). The Ca/P ratio of the apatite component in the coating, as determined by energy dispersive X-ray spectroscopy (EDX), was about 1.38 which is slightly higher than that of octocalcium phosphate (OCP). X-ray diffraction result showed that the apatite was amorphous, which was due to the low temperature (i.e., room temperature) deposition process. The structure of the composite coatings was further characterized using Fourier transform infrared reflection spectroscopy (FTIR). It was also found that, compared to bare NiTi SMA samples, the wettability of as-deposited samples was increased because of the formation of the composite coating.


2010 ◽  
Vol 25 (10) ◽  
pp. 1936-1942 ◽  
Author(s):  
Deuk Ho Yeon ◽  
Bhaskar Chandra Mohanty ◽  
Yeon Hwa Jo ◽  
Yong Soo Cho

An effective way to prepare a robust CuInSe2 (CIS) target for subsequent vapor depositions of thin films is suggested in this work. The technique involves addition of excess Se to presynthesized CIS powder followed by cold pressing and sintering at a temperature as low as 300 °C. Phase-pure chalcopyrite CIS films were prepared at a substrate temperature of 300 °C from targets that contained different amounts of excess Se. The average size of particulates, typical of the pulsed laser deposition process, and their surface coverage decreased with increasing Se content up to 50 wt% in the targets. Films grown from the target with 50 wt% excess Se exhibited a hole concentration of ˜3 × 1019 cm−3 and a Hall mobility of ˜2 cm2/Vs. With the decrease of substrate temperature to room temperature, the resistivity increased from 1.1 × 10−1 to ˜7.5 × 108 Ω·cm, which is attributed to the potential contributions of Se interstitials, CuIn, and VIn defects.


RSC Advances ◽  
2015 ◽  
Vol 5 (73) ◽  
pp. 59463-59471 ◽  
Author(s):  
Pallavi Arod ◽  
S. A. Shivashankar

Fe–Fe3O4–CNT composite thin film was obtained by single step chemical vapor deposition process using Fe(acac)3 as the sole precursor. By changing the deposition pressure, the form of carbon deposited could be changed from amorphous to CNTs.


Chemosensors ◽  
2019 ◽  
Vol 7 (1) ◽  
pp. 12 ◽  
Author(s):  
Emanuele Smecca ◽  
Salvatore Sanzaro ◽  
Clelia Galati ◽  
Lucio Renna ◽  
Leonardo Gervasi ◽  
...  

Nanostructured materials represent a breakthrough in many fields of application. Above all for sensing, the use of nanostructures with a high surface/volume ratio is strategic to raise the sensitivity towards dangerous environmental gas species. A new Dc-Reactive sputtering Deposition method has been applied to grow highly porous p-type nitrogen-doped titanium oxide layers by modifying the previously developed reactive sputtering method called gig-lox. The doping of the films was achieved at room temperature by progressive incorporation of nitrogen species during the deposition process. Two different amounts of N2 were introduced into the deposition chamber at flow rates of 2 and 5 standard cubic centimeter per minutes (sccm) for doping. It has been found that the N2 uptake reduces the deposition rate of the TiO2 film whilst the porosity and the roughness of the grown layer are not penalized. Despite the low amount of N2, using 2 sccm of gas resulted in proper doping of the TiO2 film as revealed by XPS Analyses. In this case, nitrogen atoms are mainly arranged in substitutional positions with respect to the oxygen atoms inside the lattice, and this defines the p-type character of the growing layer. Above this strategic structural modification, the multibranched spongy porosity, peculiar of the gig-lox growth, is still maintained. As proof of concept of the achievements, a sensing device was prepared by combining this modified gig-lox deposition method with state-of-the-art hot-plate technology to monitor the electrical response to ethanol gas species. The sensor exhibited a sensitivity of a factor of ≈2 to 44 ppm of ethanol at ≈200 °C as measured by a rise in the layer resistivity according to the p-type character of the material. At the higher temperature of ≈350 °C, the sensor turned to n-type as without doping. This behavior was related to a loss of nitrogen content inside the film during the annealing. It was indeed proved that p-type doping of a gig-lox sponge during growth is feasible, even at room temperature, without losing the layer porosity and the capability to host and detect environmental species. Moreover, the material integration on a device is simply done as the last production step. Easy TiO2 doping procedures, combined with porosity, are of general purpose and interest for several applications even on flexible substrates.


1998 ◽  
Vol 547 ◽  
Author(s):  
M. S. Martín-Gonzilez ◽  
E. Morán ◽  
R. Sáez-Puche ◽  
M. Á. Alario-Franco

AbstractElectrodeposition of multimetallic films at room temperature on metallic substrates followed by oxidation at high temperature (~ 900°C) has often been employed to prepare high temperature superconducting (HTSC) films. A difficulty with this otherwise cheap and simple process is that the degree of surface covering is usually not very high. We have attempted to remediate this problem by sequentially repeating the deposition process on the same film. In this way, we have improved quite markedly critical current density (Jc) of films obtained on Silver substrates.To quote some figures, Jc at 1 T is ~ 400 A/cm2 after the first deposition/oxidation process and it increases to ~ 2 000 A/cm2 after the fourth one. The evolution of the morphology of the films has been followed by means of scanning electron microscopy (SEM). It shows that, although the degree of surface coverage never attains 100 %, a substantial proportion of the substrate is well coated.We have also studied the influence of mechanical pressure on the metallic film before the thermal treatment; after the fourth deposition, a pressure of ~15 KBar was applied. In this case a ~ 7% increase in Jc was observed and the density after compression (6.98 g/cm3) attains almost 100 % of the theoretical value for YBa2Cu3O7-δ (Ybacuo).


2013 ◽  
Vol 667 ◽  
pp. 338-342
Author(s):  
Shafinaz Sobihana Shariffudin ◽  
Mohamad Hafiz Mamat ◽  
Mohamad Rusop Mahmood

ZnO heterostructures have been successfully synthesized using thermal chemical vapor deposition method. Zinc powder and oxygen were used as the starting materials, while argon gas was supplied as the carrier gas. Different types of nanostructures were deposited on layer-by-layer ZnO seeded catalyst; which its structures depended on the position of the substrates during the deposition process. Substrates at position C which is located 3 cm from the source shows uniformly distributed ZnO nanorods. XRD pattern also shows that sample C shows (0 0 2) diffraction peak. PL spectra indicates that the ZnO have two peaks, which is UV peak centered at 380 nm and visible peak centered at about 550 nm.


2012 ◽  
Vol 706-709 ◽  
pp. 617-622
Author(s):  
Rong Ma ◽  
Igor Zhitomirsky

Electrophoretic deposition method has been developed for the fabrication of organic-inorganic composite films, containing bioglass and hydroxyapatite in a hyaluronic acid matrix. The film composition and deposition yield were varied by variation of the electrochemical bath composition and deposition time. The films were studied by scanning electron microscopy, thermogravimetric analysis and X-ray diffraction methods. The deposition method offers the advantages of room temperature processing and allows the fabrication of composite films for biomedical applications.


2016 ◽  
Vol 2 (1) ◽  
pp. 43-47
Author(s):  
Christin Rapp ◽  
Andreas Baumgärtel ◽  
Lucas Artmann ◽  
Markus Eblenkamp ◽  
Syed Salman Asad

AbstractOpen air atmospheric pressure plasma jet (APPJ) enhanced chemical vapour deposition process was used to deposit biocompatible SiOx/TiOx composite coatings. The as deposited films are hydrophilic and show visible light induced photocatalytic effect, which is a consequence of the formation of defects in the TiOx structure due to the plasma process. This photocatalytic effect was verified by the demonstration of an antimicrobial effect under visible light on E. coli as well as by degradation of Rhodamine B. The films are non-cytotoxic as shown by the cytocompatibility tests. The films are conductive to cell growth and are stable in DMEM and isopropanol. The structural evaluation using SEM, EDS and XPS shows a dispersion of TiOx phase in a SiOxCyHz matrix. These analyses were used to correlate the structure-property relationship of the composite coating.


1990 ◽  
Vol 204 ◽  
Author(s):  
C. Wang ◽  
C.H. Bjorkman ◽  
D.R. Lee ◽  
M.J. Williams ◽  
G. Lucovsky

ABSTRACTWe have succeeded in depositing both activated n- and p-type μc-Si, by a low temperature, 250°C, remote PECVD process in which dopant gases (PH3 or B2H6)/Silane (SiH4) mixtures are injected downstream from the exit port of a He/H2 plasma. The room temperature conductivities and activation energies for the n- and p-type μc-Si are respectively, 40 S/cm with Eaa=0.018 eV, and 5 S/cm with Ea =0.040 eV. Doped μc-Si is obtained for PH3/SiH4 ratios up to 1%, and for B2H6/SiH4 ratios to 0.1%. For B2H6/SiH4 ratios < 0.1%, the deposited p-type material is doped a-Si rather than doped μc-Si. We have shown that these heavily doped μc-Si film are a viable candidate for the gate electrode in MOS devices. The application of these doped μc-Si films in p-i-n diode devices has also been studied.


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