Nitrogen profiles of high dose, high temperature plasma source ion implantation treated austenitic stainless steel

1994 ◽  
Vol 12 (2) ◽  
pp. 923 ◽  
Author(s):  
C. B. Franklyn
Keyword(s):  
Stainless Steel ◽  
High Temperature ◽  
Austenitic Stainless Steel ◽  
Ion Implantation ◽  
Plasma Source ◽  
High Dose ◽  
Temperature Plasma ◽  
High Temperature Plasma ◽  
Plasma Source Ion Implantation

Structural Analysis of Silicon Doped by Plasma Source Ion Implantation

1993 ◽  
Vol 316 ◽  
Author(s):  
R.J. Matyi ◽  
D.L. Chapek ◽  
J.R. Conrad ◽  
S.B. Felch
Keyword(s):  
Ion Implantation ◽  
Diffuse Scattering ◽  
Structural Changes ◽  
Plasma Source ◽  
Perfect Crystal ◽  
Crystal Defects ◽  
High Dose ◽  
X Ray ◽  
Doped Silicon ◽  
Plasma Source Ion Implantation

ABSTRACTWe have used high resolution x-ray diffraction to analyze the structural changes that accompany boron doping of silicon by BF3 plasma source ion implantation (PSII). Triple crystal diffraction analysis of as-implanted PSII doped silicon showed little excess x-ray diffuse scattering, even when analyzed using the asymmetric (113) reflection for increased surface sensitivity. This result suggests that PSΠ is capable of providing high dose implantation with low damage. Annealing of the PSII-doped silicon showed the development of a compressive surface layer, indicated by enhanced x-ray scattering directed perpendicular to the surface. Virtually all of the scattering from the annealed samples was concentrated in the so-called “surface streak” which arises due to dynamical diffraction from the perfect crystal Si structure. Little if any diffuse scattering due to kinematic scattering from crystal defects was detected. These observations indicate that plasma source doping can be used to achieve both a shallow implant depth and an extremely uniform incorporation of boron into the silicon lattice.

scholarly journals Effects of high temperature plasma immersion ion implantation on wear resistance of Ti-Si-B sintered alloys

2013 ◽  
Vol 228 ◽  
pp. 195-200 ◽  
Author(s):  
Bruno Bacci Fernandes ◽  
Rogério Moraes Oliveira ◽  
Mário Ueda ◽  
Samantha de Fátima Magalhães Mariano ◽  
Alfeu Saraiva Ramos ◽  
...  
Keyword(s):  
Wear Resistance ◽  
High Temperature ◽  
Ion Implantation ◽  
Temperature Plasma ◽  
High Temperature Plasma ◽  
Plasma Immersion Ion Implantation ◽  
Sintered Alloys

scholarly journals Carbon, Nitrogen, and Oxygen Ion Implantation of Stainless Steel

1995 ◽  
Vol 396 ◽  
Author(s):  
D.J. Rej ◽  
N.V. Gavrilov ◽  
D. Emlin ◽  
I. Henins ◽  
K. Kern ◽  
...  
Keyword(s):  
Stainless Steel ◽  
Ion Implantation ◽  
Plasma Source ◽  
Beam Line ◽  
Ion Current ◽  
Concentration Profiles ◽  
Oxygen Ion ◽  
Plasma Source Ion Implantation ◽  
Current Densities ◽  
Oxygen Ion Implantation

AbstractIon implantation experiments of C, N and O into stainless steel have been performed with beam-line and plasma source ion implantation methods. Acceleration voltages are varied between 27 and 50 kV, with pulsed ion current densities between 1 and 10 mA/cm2. Implanted doses range from 0.5 to 3×1018cm-2, while workpiece temperatures are maintained between 25 and 800°C. The implant concentration profiles, microstructure and surface mechanical properties of the implanted materials are reported.

High temperature plasma immersion ion implantation of Ti6Al4V

2007 ◽  
Vol 201 (9-11) ◽  
pp. 4953-4956 ◽  
Author(s):  
M. Ueda ◽  
M.M. Silva ◽  
C.M. Lepienski ◽  
P.C. Soares ◽  
J.A.N. Gonçalves ◽  
...  
Keyword(s):  
High Temperature ◽  
Ion Implantation ◽  
Temperature Plasma ◽  
High Temperature Plasma ◽  
Plasma Immersion Ion Implantation
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