Comparative evaluation of chemically amplified resists for electron-beeam top surface imaging use

1994 ◽  
Vol 12 (6) ◽  
pp. 3925 ◽  
Author(s):  
M. Irmscher
Keyword(s):  
Comparative Evaluation ◽  
Surface Imaging ◽  
Chemically Amplified ◽  
Top Surface Imaging ◽  
Chemically Amplified Resists

Comparative evaluation of e-beam sensitive chemically amplified resists for mask making

2002 ◽  
Author(s):  
Mathias Irmscher ◽  
Dirk Beyer ◽  
Joerg Butschke ◽  
Chris Constantine ◽  
Thomas Hoffmann ◽  
...  
Keyword(s):  
Comparative Evaluation ◽  
Chemically Amplified ◽  
Mask Making ◽  
Chemically Amplified Resists

scholarly journals Study of high photo-speed top surface imaging process using chemically amplified resist.

1998 ◽  
Vol 11 (4) ◽  
pp. 613-618
Author(s):  
Shigeyasu Mori ◽  
Nobuyuki Matsuzawa ◽  
Yuko Kaimoto ◽  
Masayuki Endo ◽  
Takahiro Matsuo ◽  
...  
Keyword(s):  
Surface Imaging ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Top Surface Imaging

Non-chemically amplified 193-nm top surface imaging photoresist development: polymer substituent and polydispersity effects

1999 ◽  
Author(s):  
Myoung-Soo Kim ◽  
Hyoung-Gi Kim ◽  
Hyeong-Soo Kim ◽  
Ki-Ho Baik ◽  
Donald W. Johnson ◽  
...  
Keyword(s):  
Surface Imaging ◽  
Chemically Amplified ◽  
Top Surface Imaging ◽  
193 Nm

Heating effect of the radiation chemistry of polyhydroxystyrene-type chemically amplified resists

2020 ◽  
Vol 59 (8) ◽  
pp. 086506
Author(s):  
Yuta Ikari ◽  
Kazumasa Okamoto ◽  
Akihiro Konda ◽  
Takahiro Kozawa ◽  
Takao Tamura
Keyword(s):  
Radiation Chemistry ◽  
Heating Effect ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

Characterizing acid diffusion lengths in chemically amplified resists from measurements of deprotection kinetics

2014 ◽  
Vol 13 (4) ◽  
pp. 043017 ◽  
Author(s):  
Abhijit A. Patil ◽  
Yogendra Narayan Pandey ◽  
Manolis Doxastakis ◽  
Gila E. Stein
Keyword(s):  
Acid Diffusion ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

Design and Lithographic Characteristics of Alicyclic Fluoropolymer for ArF Chemically Amplified Resists

2006 ◽  
Vol 45 (No. 46) ◽  
pp. L1230-L1231
Author(s):  
Katsumi Maeda ◽  
Kaichiro Nakano ◽  
Masamitsu Shirai
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resists
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