chemically amplified resists
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Author(s):  
Naoki Tanaka ◽  
Kyoko Matsuoka ◽  
Takahiro KOZAWA ◽  
Takuya Ikeda ◽  
Yoshitaka Komuro ◽  
...  

Abstract The dissolution behavior of a simple combination of poly(4-hydroxystyrene) (PHS) films and tetramethylammonium hydroxide (TMAH) aqueous solution was analyzed to gain a fundamental understanding of the effects of film thickness and alkaline concentration on the dissolution kinetics of chemically amplified resists (CARs). Films of four different thicknesses, from thick (approximately 900 nm) to thin (approximately 50 nm), were developed in 22 different developers of different concentrations. The dissolution behavior of each combination was observed using a quartz crystal microbalance (QCM). Differences in dissolution kinetics due to film thickness were observed even between relatively thick films such as 900- and 500-nm thick films in dilute developers. These differences were considered to be caused by the diffusion of the solution into the films. Thin films also showed characteristic behavior with dilution. This behavior was due to the interaction between the substrate and the films, unlike in the case of thick films.


Author(s):  
Yuko Tsutsui Ito ◽  
Takahiro KOZAWA

Abstract With the sharpening of optical images, the capability of resist materials has become a serious concern in lithography. The dissolution of a resist polymer is key to the realization of ultrafine patterning. However, the details of the dissolution of resist polymers remain unclarified. In this study, the relationships of surface free energy with swelling and dissolution kinetics were investigated using poly(4-hydroxystyrene) (PHS) film with triphenylsulfonium-nonaflate (TPS-nf). Developers were water and 2.38 wt% tetramethylammonium hydroxide (TMAH) aqueous solution. PHS and TPS-nf are a typical backbone polymer (a dissolution agent) and a typical acid generator of chemically amplified resists, respectively. The water intake and dissolution of PHS film with TPS-nf became fast with increasing UV exposure dose. It was found that the increase in the polar components (particularly, the hydrogen bonding component) and the decrease in the dispersion component of surface free energy underlie the fast water intake and dissolution.


2021 ◽  
Vol 21 (8) ◽  
pp. 4466-4469
Author(s):  
Sang-Kon Kim

Although being the optical lithography, the extreme ultraviolet (EUV) lithography with 13.5-nm wavelength is very different from the deep ultraviolet (DUV) lithography with 193-nm wavelength. Hence, the understanding of the complex detailed EUV mechanisms to cause a chemical reaction in chemically amplified resists (CARs) is required to develop EUV resists and exposure process. In this paper, for organic, metal-organic and metal-oxide resists, the electron-scattering model of exposure mechanisms needs to include the elastic and inelastic mean free paths. On top of that, Dill’s parameters of DUV and EUV resisters from the photo-generated reaction are discussed to indicate the physical and chemical characteristics. For CAR and EUV resists, Dill B parameter is large than Dill A and B parameters.


2021 ◽  
Vol 54 (4) ◽  
pp. 1912-1925
Author(s):  
Christopher M. Bottoms ◽  
Tanguy Terlier ◽  
Gila E. Stein ◽  
Manolis Doxastakis

2020 ◽  
Vol 533 ◽  
pp. 146553
Author(s):  
Guilherme K. Belmonte ◽  
Suelen W. Cendron ◽  
Pulikanti Guruprasad Reddy ◽  
Cleverson A.S. Moura ◽  
Mohamad Ghulam Moinuddin ◽  
...  

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