Field emitter array mask patterning using laser interference lithography

Author(s):  
J. P. Spallas
Laser Physics ◽  
2009 ◽  
Vol 19 (3) ◽  
pp. 505-510 ◽  
Author(s):  
R. Sidharthan ◽  
F. Chollet ◽  
V. M. Murukeshan

2009 ◽  
Vol 48 (6) ◽  
pp. 06FK02 ◽  
Author(s):  
Masayoshi Nagao ◽  
Tomoya Yoshida ◽  
Seigo Kanemaru ◽  
Yoichiro Neo ◽  
Hidenori Mimura

2021 ◽  
pp. 2150459
Author(s):  
Xiangxian Wang ◽  
Tianxu Jia ◽  
Jiankai Zhu ◽  
Yingwen Su ◽  
Liping Zhang ◽  
...  

In this study, we systematically and comprehensively investigated the influence of polarization angle on the fabrication of micro-structures by multi-beam laser interference lithography. Using theoretical analysis and simulation, we studied the effect of different polarization combinations, i.e. transverse electric (TE) and transverse magnetic (TM) polarization combinations, on the characteristics of the micro-structures fabricated by three-, four-, and six-beam laser interference lithography. We successfully obtained micro-structures with different periodic patterns such as honeycomb dots, quasi-elliptic dots, different square dots, and quasi-triangular dots. The simulation results illustrate that polarization affects the formation of interference patterns, pattern contrasts, and periods. The methods discussed herein are simple, low cost, and allow excellent control over structural parameters, and hence are useful for the micro-structure manufacturing industry.


2020 ◽  
Vol 124 (5) ◽  
pp. 3297-3305 ◽  
Author(s):  
Nestor Gisbert Quilis ◽  
Simone Hageneder ◽  
Stefan Fossati ◽  
Simone K. Auer ◽  
Priyamvada Venugopalan ◽  
...  

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