scholarly journals Simulation of shotnoise induced side-wall roughness in electron lithography

2016 ◽  
Author(s):  
T. Verduin ◽  
S. R. Lokhorst ◽  
C. W. Hagen ◽  
P. Kruit
Keyword(s):  
Side Wall ◽  
Wall Roughness ◽  
Electron Lithography

The Dependence of Demolding Characteristics on Side Wall Roughness of Mold in Thermal Imprint

2008 ◽  
Vol 128 (8) ◽  
pp. 325-330 ◽  
Author(s):  
Hiroaki Kawata ◽  
Junya Ishihara ◽  
Masayo Kayama ◽  
Masaaki Yasuda ◽  
Yoshihiko Hirai
Keyword(s):  
Side Wall ◽  
Wall Roughness

scholarly journals Investigation of Side Wall Roughness Effect on Optical Losses in a Multimode Si3N4 Waveguide Formed on a Quartz Substrate

Photonics ◽  
2020 ◽  
Vol 7 (4) ◽  
pp. 104
Author(s):  
Anastasia Yakuhina ◽  
Alexey Kadochkin ◽  
Vyacheslav Svetukhin ◽  
Dmitry Gorelov ◽  
Sergey Generalov ◽  
...  
Keyword(s):  
Optical Waveguides ◽  
Quartz Substrate ◽  
Side Wall ◽  
Wall Roughness ◽  
Roughness Parameters ◽  
Optical Losses ◽  
Waveguide Width ◽  
Integration Density ◽  
Frequency Domain Reflectometry ◽  
Multimode Operation

This article presents the results of the study of the influence of the most significant parameters of the side wall roughness of an ultra-thin silicon nitride lightguide layer of multimode integrated optical waveguides with widths of 3 and 8 microns. The choice of the waveguide width was made due to the need to provide multimode operation for telecommunication wavelengths, which is necessary to ensure high integration density. Scattering in waveguide structures was measured by optical frequency domain reflectometry (OFDR) of a backscattering reflectometer. The finite difference time domain method (FDTD) was used to study the effect of roughness parameters on optical losses in fabricated waveguides, the roughness parameters that most strongly affect optical scattering were determined, and methods of its significant reduction were specified. The prospects for implementing such structures on a quartz substrate are justified.

Side-wall roughness of deep trenches in 1D and 2D periodic silicon structures fabricated by photoelectrochemical etching

2011 ◽  
Vol 8 (6) ◽  
pp. 1936-1940 ◽  
Author(s):  
E. V. Astrova ◽  
G. V. Fedulova ◽  
Yu. A. Zharova ◽  
E. V. Gushchina
Keyword(s):  
Side Wall ◽  
Wall Roughness ◽  
Photoelectrochemical Etching ◽  
Silicon Structures

Side wall roughness in ultradeep X-ray lithography

2002 ◽  
Vol 9 (1-2) ◽  
pp. 130-132 ◽  
Author(s):  
N. Moldovan ◽  
D. C. Mancini ◽  
R. Divan ◽  
O. V. Makarova ◽  
A. Peele ◽  
...  
Keyword(s):  
Side Wall ◽  
Wall Roughness ◽  
X Ray
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