Fabricating arrays of vanadium dioxide nanodisks by focused ion-beam lithography and pulsed-laser deposition

2004 ◽  
Author(s):  
Richard F. Haglund, Jr. ◽  
Rene Lopez ◽  
J. Y. Suh ◽  
Leonard C. Feldman ◽  
Tony E. Haynes ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Vanadium Dioxide ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Ion Beam Lithography

Ion beam lithographic fabrication of ordered VO2 nanoparticle arrays

2004 ◽  
Vol 820 ◽  
Author(s):  
R. Lopez ◽  
J. Y. Suh ◽  
L. C. Feldman ◽  
R. F. Haglund
Keyword(s):  
Pulsed Laser Deposition ◽  
Vanadium Dioxide ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Optical Resonances ◽  
Ordered Arrays ◽  
Close Proximity ◽  
The Difference

AbstractLong-range ordered arrays of vanadium dioxide nanoparticles are fabricated by pulsed laser deposition in a patterned layer of poly(methyl methacrylate) resist. The two- dimensional arbitrary pattern is created by focused ion beam exposure of the resist, followed by pulsed laser deposition and thermal annealing. Interaction of light with the nanoparticles is controlled by their geometrical arrangement as well as by the difference in optical properties displayed between the metallic and semiconducting phases of VO2. Arrays like this open opportunities to study optical resonances and interactions for nanoparticles in close proximity, in the framework of the metal-semiconductor phase transition in VO2.

Fabricating Two-Dimensional Metal Nanocrystal Arrays Using Pulsed-Laser Deposition and Focused Ion-Beam Technologies

2000 ◽  
Vol 636 ◽  
Author(s):  
Richard F. Haglund ◽  
Robert A. Weller ◽  
Cynthia E. Heiner ◽  
Matthew D. McMahon ◽  
Robert H. Magruder ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
High Vacuum ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Silicon Surfaces ◽  
Silver Nanoclusters ◽  
Laser Evaporation ◽  
Si Substrates

AbstractWe describe recent experiments in which we attempted the initial steps for fabricating twodimensional arrays of metal nanocrystals. We use a commercial pulsed-laser deposition system in concert with a focused ion beam to attempt control over both lateral and vertical dimensions at the nanometer length scale. In our experiments, regular arrays of holes typically 80 nm in diameter were drilled in Si substrates using the focused ion beam. Silver atoms were then deposited onto these substrates by pulsed laser evaporation from a metallic target in high vacuum. Under certain conditions of substrate temperature, laser pulse repetition rate, and fluence, small silver nanoclusters form preferentially around the structures previously etched in the silicon surfaces by the focused ion beam.

Research Progress of Vanadium Dioxide Thin Film Fabricated by Pulsed Laser Deposition

2009 ◽  
Vol 46 (6) ◽  
pp. 49-53
Author(s):  
王海方 Wang Haifang ◽  
李毅 Li Yi ◽  
蒋群杰 Jiang Qunjie ◽  
俞晓静 Yu Xiaojing ◽  
胡双双 Hu Shuangshuang ◽  
...  
Keyword(s):  
Thin Film ◽  
Pulsed Laser Deposition ◽  
Vanadium Dioxide ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Research Progress

Ion-beam luminescence of thin-film CdS on glass formed by pulsed-laser deposition

2005 ◽  
Vol 97 (2) ◽  
pp. 023512 ◽  
Author(s):  
M. Khanlary ◽  
P. Townsend ◽  
B. Ullrich ◽  
D. E. Hole
Keyword(s):  
Thin Film ◽  
Pulsed Laser Deposition ◽  
Ion Beam ◽  
Pulsed Laser ◽  
Laser Deposition

Carbon Nitride Thin Films Grown by Pulsed Laser Deposition

1993 ◽  
Vol 327 ◽  
Author(s):  
Randolph E. Treece ◽  
James S. Horwitz ◽  
Douglas B. Chrisey
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Carbon Nitride ◽  
Ion Beam ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
X Ray Diffraction ◽  
Deposition Parameters ◽  
Wide Range ◽  
Gas Atmosphere

AbstractThin films of diamond and diamond-like carbon (DLC) are technologically important materials that serve as hard, scratch resistant and chemically inert coatings for tools and optics. Recent calculations suggest that β-C3N4 should be harder than diamond. We have deposited carbon nitride (CNx) thin films by pulsed laser deposition. The films were grown from a graphite target in a nitrogen background. The nitrogen source was either (a) a N2 gas atmosphere, or (b) a N2+/N+ ion beam generated by a Kaufman ion gun. A wide range of deposition parameters were investigated, such as deposition pressure (0.3-900 mTorr N2), substrate temperature (50 and 600°C), and laser fluence (1-4 J/cm2) and laser repetition rate (1-10 Hz). The films have been characterized by Rutherford Backscattering Spectroscopy, thin-film X-ray diffraction, scanning electron microscopy, and micro-Raman spectroscopy. In general, the films were nitrogen deficient with a maximum nitrogen to carbon ratio (N/C) of 0.45 and a shift in the G band Raman peak consistent with amorphous CNx (a-CNx).

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