THE SURFACE STRUCTURE OF A LOW Pd Cu/Pd-(110) CRYSTAL ALLOY

1994 ◽  
Vol 01 (04) ◽  
pp. 569-571 ◽  
Author(s):  
M. BOWKER ◽  
M. NEWTON ◽  
S.M. FRANCIS ◽  
M. GLEESON ◽  
C. BARNES
Keyword(s):  
Surface Structure ◽  
Surface Region ◽  
Single Scattering ◽  
Alloy Surface ◽  
High Concentration ◽  
Near Surface ◽  
X Ray ◽  
Photoelectron Diffraction ◽  
Layer 2

X-ray photoelectron diffraction studies of this alloy surface have been carried out and indicate that there is a significant expansion of the lattice in the near-surface region due to the high concentration of Pd in layer 2. Preliminary single scattering calculations lend support to this proposal for the surface structure, and place this expansion in the subsurface mainly between layers 2 and 3.

Electronic Impact of Inclusions in Diamond

2009 ◽  
Vol 1203 ◽  
Author(s):  
Erik M. Muller ◽  
John Smedley ◽  
Balaji Raghothamachar ◽  
Mengjia Gaowei ◽  
Jeffrey W. Keister ◽  
...  
Keyword(s):  
Charge Trapping ◽  
Secondary Phase ◽  
Surface Region ◽  
Phase Region ◽  
Electron Trapping ◽  
Near Surface ◽  
X Ray ◽  
Photoconductive Gain ◽  
Single Crystal Diamond ◽  
Topography Data

AbstractX-ray topography data are compared with photodiode responsivity maps to identify potential candidates for electron trapping in high purity, single crystal diamond. X-ray topography data reveal the defects that exist in the diamond material, which are dominated by non-electrically active linear dislocations. However, many diamonds also contain defects configurations (groups of threading dislocations originating from a secondary phase region or inclusion) in the bulk of the wafer which map well to regions of photoconductive gain, indicating that these inclusions are a source of electron trapping which affect the performance of diamond X-ray detectors. It was determined that photoconductive gain is only possible with the combination of an injecting contact and charge trapping in the near surface region. Typical photoconductive gain regions are 0.2 mm across; away from these near-surface inclusions the device yields the expected diode responsivity.

scholarly journals Anomalous Grazing X-ray Reflectometry for Determining the Number Density of Atoms in the Near-Surface Region

1996 ◽  
Vol 37 (1) ◽  
pp. 39-44 ◽  
Author(s):  
Masatoshi Saito ◽  
Eiichiro Matsubara ◽  
Yoshio Waseda
Keyword(s):  
Surface Region ◽  
Number Density ◽  
Near Surface ◽  
X Ray

Revealing the mechanism of the early stages of Ni–W RABiTS oxidation

2010 ◽  
Vol 25 (12) ◽  
pp. 2362-2370 ◽  
Author(s):  
Andrey V. Blednov ◽  
Oleg Yu. Gorbenko ◽  
Dmitriy P. Rodionov ◽  
Andrey R. Kaul
Keyword(s):  
Internal Oxidation ◽  
Photoelectron Spectroscopy ◽  
Oxidation Mechanism ◽  
Surface Oxidation ◽  
Surface Region ◽  
Near Surface ◽  
Precise Position ◽  
X Ray ◽  
Early Stages ◽  
Phase And Chemical Composition

The early stages of surface oxidation of biaxially textured Ni–W tapes were studied using thermodynamic calculations along with experimental tape oxidation at low P(O2). Tape phase and chemical composition, surface morphology, and roughness were examined using x-ray diffraction (XRD), energy-dispersive x-ray analysis (EDX), secondary ion mass spectroscopy (SIMS), x-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM). For a Ni0.95W0.05 alloy tape, the precise position of the tape oxidation line in P(O2)–T coordinates was established. This line includes a break at T ≈ 650 °C that originates from the change of the W oxidation mechanism from internal oxidation to oxidation on a free surface accompanied by segregation of the alloy components in the tape near-surface region. The surface roughness of a polished tape increased drastically during internal oxidation of W; further tape oxidation did not affect the integral roughness parameters, but introduced numerous small (˜;100 nm) features on the tape surface comprising NiO precipitates.

scholarly journals Microstructure and Mechanical Properties of Ti + N Ion Implanted Cronidur30 Steel

Materials ◽  
2019 ◽  
Vol 12 (3) ◽  
pp. 427 ◽  
Author(s):  
Jie Jin ◽  
Wei Wang ◽  
Xinchun Chen
Keyword(s):  
Mechanical Properties ◽  
Ion Implantation ◽  
Photoelectron Spectroscopy ◽  
Structural Modification ◽  
Surface Region ◽  
Grazing Incidence ◽  
Bearing Steel ◽  
Near Surface ◽  
X Ray ◽  
Ion Implanted

In this study, Ti + N ion implantation was used as a surface modification method for surface hardening and friction-reducing properties of Cronidur30 bearing steel. The structural modification and newly-formed ceramic phases induced by the ion implantation processes were investigated by transmission electron microscopy (TEM), X-ray photoelectron spectroscopy (XPS), and grazing incidence X-ray diffraction (GIXRD). The mechanical properties of the samples were tested by nanoindentation and friction experiments. The surface nanohardness was also improved significantly, changing from ~10.5 GPa (pristine substrate) to ~14.2 GPa (Ti + N implanted sample). The friction coefficient of Ti + N ion implanted samples was greatly reduced before failure, which is less than one third of pristine samples. Furthermore, the TEM analyses confirmed a trilamellar structure at the near-surface region, in which amorphous/ceramic nanocrystalline phases were embedded into the implanted layers. The combined structural modification and hardening ceramic phases played a crucial role in improving surface properties, and the variations in these two factors determined the differences in the mechanical properties of the samples.

X-Ray diagnostics of 2D deformation profiles in crystals with periodically distorted near-surface region

1992 ◽  
Vol 130 (2) ◽  
pp. 263-271 ◽  
Author(s):  
T. E. Goureev ◽  
A. Yu. Nikulin ◽  
P. V. Petrashen
Keyword(s):  
Surface Region ◽  
Near Surface ◽  
X Ray

STRUCTURAL DETERMINATION OF THE Si/Cu(110) INTERFACE BY PHOTOELECTRON DIFFRACTION

1997 ◽  
Vol 04 (06) ◽  
pp. 1331-1335 ◽  
Author(s):  
C. ROJAS ◽  
J. A. MARTÍn-GAGO ◽  
E. ROMÁN ◽  
G. PAOLUCCI ◽  
B. BRENA ◽  
...  
Keyword(s):  
Room Temperature ◽  
Structural Parameters ◽  
Single Scattering ◽  
Structural Determination ◽  
X Ray ◽  
Photoelectron Diffraction ◽  
First Order ◽  
Proposed Model ◽  
Laboratory Source

Deposition of 0.5 Si monolayer (ML) on a Cu (110) surface at room temperature (RT) leads to the formation of a c(2×2) LEED pattern. In order to find out the surface atomic structure of this ordered phase, X-ray photoelectron diffraction (XPD) azimuthal scans at different photon energies and full hemispherical XPD patterns of the Si 2 p core level have been measured using both synchrotron radiation and a laboratory source. We present an atomic model for the surface structure based on the examination of forward scattering and first order interference XPD features. Refinement of the structural parameters was achieved by performing single scattering cluster (SSC) calculations. In the proposed model Si atoms replace Cu atoms at the surface along the [Formula: see text] atomic rows.

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