Multi-Functional Cr–Al–Ti–Si–N Nanocomposite Films Deposited on WC-Co Substrate for Cutting Tools

Multi-functional quinary Cr–Al–Ti–Si–N thin films were deposited onto WC-Co substrates using a cathodic arc evaporation system. In this study, the influence of silicon contents on the microstructure, mechanical, tribological, and oxidation properties of Cr–Al–Ti–Si–N thin films were systematically investigated and correlated for application of cutting tools. Based on results from various analyses, the Cr–Al–Ti–Si–N films showed excellent properties including mechanical, tribological, oxidation and adhesion values compared with those of the Cr–Al–Ti–N film. The Cr–Al–Ti–Si–N films with a Si content of around 4.21 at.% exhibited the highest hardness of 45 GPa, very low friction coefficient of 0.38 at room temperature against an Inconel alloy ball and superior adhesion property (105 N). The Cr–Al–Ti–Si–N films also showed excellent oxidation resistance after annealing in the ambient air at 1000 °C. Therefore, the Cr–Al–Ti–Si(4.21 at.%)–N films could be help to improve the performance of machining and cutting tools with application of the films.