A Continuous-Flow Method for Chemical Vapor Deposition of Tetramethoxysilane on .GAMMA.-Alumina to Prepare Silica Monolayer Solid Acid Catalyst.

An unprecedented two-step sequence was designed by combining batch and continuous flow (CF) protocols for the upgrading of two aminodiol regioisomers derived from glycerol, i.e., 3-amino-1,2-propanediol and 2-amino-1,3-propanediol (serinol). Under batch conditions, at 80–90 °C, both substrates were quantitatively converted into the corresponding amides through a catalyst-free N-acetylation reaction mediated by an innocuous enol ester as isopropenyl acetate (iPAc). Thereafter, at 30–100 °C and 1–10 atm, the amide derivatives underwent a selective CF-acetalisation in the presence of acetone and a solid acid catalyst, to afford the double-functionalized (amide-acetal) products.

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CONTROLLABLE CHEMICAL VAPOR DEPOSITION SYNTHESIS OF SINGLE-WALL CARBON NANOTUBES USING MIST FLOW METHOD

NANO ◽

10.1142/s1793292012500452 ◽

2012 ◽

Vol 07 (06) ◽

pp. 1250045 ◽

Cited By ~ 4

Author(s):

YUN SUN ◽

RYO KITAURA ◽

TAKUYA NAKAYAMA ◽

YASUMITSU MIYATA ◽

HISANORI SHINOHARA

Keyword(s):

Electron Microscopy ◽

Carbon Nanotubes ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Single Wall Carbon Nanotubes ◽

Flow Method ◽

Mist Flow ◽

Mean Diameter ◽

The Mean

The influences of synthesis parameters on the mean diameter and diameter distribution of as-grown single-wall carbon nanotubes (SWCNTs) with chemical vapor deposition (CVD) using the mist flow method have been investigated in detail with Raman spectroscopy, scanning electron microscopy (SEM) and transmission electron microscopy (TEM). We found that CVD reaction temperature and flow rate play an essential role in controlling the mean diameter and the quality of as-grown SWCNTs. Furthermore, we found that the carbon supply kinetics can be a dominant factor to determine the diameter of as-grown SWCNTs in the present mist flow method. Under a different combination of various parameters, the mean diameter of SWCNTs can be varied from 0.9 nm to 1.5 nm controllably.

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Nitration of Benzene in a Continuous-Flow Microreactor Integrated with Microfiber-Structured Nafion/SiO2 Solid Acid Catalyst

Acta Physico-Chimica Sinica ◽

10.3866/pku.whxb20090926 ◽

2009 ◽

Vol 25 (10) ◽

pp. 2045-2049 ◽

Cited By ~ 1

Author(s):

YANG Jiu-Long ◽

◽

LI Jian-Feng ◽

LU Yong

Keyword(s):

Continuous Flow ◽

Solid Acid ◽

Solid Acid Catalyst ◽

Acid Catalyst ◽

Flow Microreactor

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Liquid phase aromatization of bio-based ketones over a stable solid acid catalyst under batch and continuous flow conditions

Catalysis Communications ◽

10.1016/j.catcom.2022.106402 ◽

2022 ◽

pp. 106402

Author(s):

Phillip Reif ◽

Navneet Kumar Gupta ◽

Marcus Rose

Keyword(s):

Liquid Phase ◽

Continuous Flow ◽

Solid Acid ◽

Solid Acid Catalyst ◽

Acid Catalyst ◽

Flow Conditions

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Preparation of Polycarbosilane Using a Catalytic Process and Its Practical Uses

Key Engineering Materials ◽

10.4028/www.scientific.net/kem.287.108 ◽

2005 ◽

Vol 287 ◽

pp. 108-111 ◽

Cited By ~ 4

Author(s):

Y. Kim ◽

Dong Geun Shin ◽

Hyung Rae Kim ◽

Hong Sik Park ◽

Doh Hyung Riu

Keyword(s):

Solid Acid ◽

Solid Acid Catalyst ◽

Chemical Vapor ◽

Acid Catalyst ◽

Polymeric Precursor ◽

Molecular Weights ◽

Organometallic Precursor ◽

Sic Ceramic ◽

Solid Nmr ◽

Ft Ir

Polycarbosilane is the most typical polymeric precursor for SiC ceramic. In this study, liquid type polycarbosilane was synthesized from polydimethylsilane in the presence of solid acid catalyst at 350oC. The molecular weights of the polycarbosilane were ranged between 350 and 530. Synthesized polycarbosilane was characterized with 29Si Solid NMR, FT-IR and GPC analysis. The synthesized polycarbosilane can be used as a good organometallic precursor for SiC coating via chemical vapor deposition or spin coating.

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Continuous-flow hydration–condensation reaction: Synthesis of α,β-unsaturated ketones from alkynes and aldehydes by using a heterogeneous solid acid catalyst

Beilstein Journal of Organic Chemistry ◽

10.3762/bjoc.7.198 ◽

2011 ◽

Vol 7 ◽

pp. 1680-1687 ◽

Cited By ~ 25

Author(s):

Magnus Rueping ◽

Teerawut Bootwicha ◽

Hannah Baars ◽

Erli Sugiono

Keyword(s):

Heterogeneous Catalyst ◽

Continuous Flow ◽

Solid Acid ◽

Condensation Reaction ◽

Solid Acid Catalyst ◽

Acid Catalyst ◽

Reaction Synthesis ◽

Unsaturated Ketones ◽

Heterogeneous Solid ◽

Convenient Access

A simple, practical and efficient continuous-flow hydration–condensation protocol was developed for the synthesis of α,β-unsaturated ketones starting from alkynes and aldehydes by employing a heterogeneous catalyst in a flow microwave. The procedure presents a straightforward and convenient access to valuable differently substituted chalcones and can be applied on multigram scale.

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In situ study of electron beam-induced chemical vapor deposition of Au in an environmental TEM

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100137653 ◽

1995 ◽

Vol 53 ◽

pp. 256-257

Author(s):

J. Drucker ◽

R. Sharma ◽

J. Kouvetakis ◽

K.H.J. Weiss

Keyword(s):

Electron Beam ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Quantum Effect ◽

Line Drawing ◽

Chemical Vapor ◽

Environmental Cell ◽

Engineering Changes ◽

Kinetics Of

Patterning of metals is a key element in the fabrication of integrated microelectronics. For circuit repair and engineering changes constructive lithography, writing techniques, based on electron, ion or photon beam-induced decomposition of precursor molecule and its deposition on top of a structure have gained wide acceptance Recently, scanning probe techniques have been used for line drawing and wire growth of W on a silicon substrate for quantum effect devices. The kinetics of electron beam induced W deposition from WF6 gas has been studied by adsorbing the gas on SiO2 surface and measuring the growth in a TEM for various exposure times. Our environmental cell allows us to control not only electron exposure time but also the gas pressure flow and the temperature. We have studied the growth kinetics of Au Chemical vapor deposition (CVD), in situ, at different temperatures with/without the electron beam on highly clean Si surfaces in an environmental cell fitted inside a TEM column.

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The relaxation of compressive biaxial strains in SOS via microtwins

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100155013 ◽

1989 ◽

Vol 47 ◽

pp. 608-609

Author(s):

M. E. Twigg ◽

E. D. Richmond ◽

J. G. Pellegrino

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Molecular Beam Epitaxy ◽

Compressive Stress ◽

Vapor Deposition ◽

Partial Dislocation ◽

Molecular Beam ◽

Volume Fraction ◽

Chemical Vapor ◽

Silicon Thin Film

For heteroepitaxial systems, such as silicon on sapphire (SOS), microtwins occur in significant numbers and are thought to contribute to strain relief in the silicon thin film. The size of this contribution can be assessed from TEM measurements, of the differential volume fraction of microtwins, dV/dν (the derivative of the microtwin volume V with respect to the film volume ν), for SOS grown by both chemical vapor deposition (CVD) and molecular beam epitaxy (MBE).In a (001) silicon thin film subjected to compressive stress along the [100] axis , this stress can be relieved by four twinning systems: a/6[211]/( lll), a/6(21l]/(l1l), a/6[21l] /( l1l), and a/6(2ll)/(1ll).3 For the a/6[211]/(1ll) system, the glide of a single a/6[2ll] twinning partial dislocation draws the two halves of the crystal, separated by the microtwin, closer together by a/3.

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